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Method for coating substrates and mask holder

  • US 20040052942A1
  • Filed: 10/06/2003
  • Published: 03/18/2004
  • Est. Priority Date: 12/15/2000
  • Status: Abandoned Application
First Claim
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1. A method for coating substrates by means of physical vapour deposition (PVD) and/or chemical vapour deposition (CVD) having any coating thickness distributions, especially for manufacturing optical single-layer or multi-layer systems for the visible, extreme ultraviolet and x-ray wavelength ranges, in which between at least one substrate to be coated and at least one particle source at least one mask is provided, characterised in that a mask with i>

  • 1 apertures is used, whose position on the mask surface is described by the family of vectors pi=ni1v1+ni2v2 and whose area is a function of the position, wherein the family of vectors depends on the desired thickness distribution, i is a natural number, ni1 and ni2 are integers and v1, v2 and pi are vectors;

    relative motion is accomplished between mask and/or substrate and/or particle source.

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