Use of ion beams for protecting substrates from particulate defect contamination in ultra-low-defect coating processes
First Claim
1. A method for actively protecting a substrate from particulate contamination while a thin film is being applied to the substrate, comprising directing an intense beam of ions through the space immediately in front of a surface being coated, wherein the kinetic energy of said ions is used to deflect an approaching particle away from said substrate, preventing it from reaching the surface being coated.
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Accused Products
Abstract
A method and means are provided for actively protecting a substrate from particulate contamination during thin film deposition. An intense beam of ions or ionized clusters is directed through the space immediately in front of the surface being coated, and the kinetic energy of the ions is used to deflect any approaching particle defects to the side, preventing them from reaching the surface being coated.
34 Citations
16 Claims
- 1. A method for actively protecting a substrate from particulate contamination while a thin film is being applied to the substrate, comprising directing an intense beam of ions through the space immediately in front of a surface being coated, wherein the kinetic energy of said ions is used to deflect an approaching particle away from said substrate, preventing it from reaching the surface being coated.
- 7. An apparatus for actively protecting a substrate from particulate contamination while a thin film is being applied to the substrate, comprising an ion gun positioned to direct an intense beam of ions through the space immediately in front of a surface being coated, wherein the kinetic energy of ions produced by said ion gun is used to deflect an approaching particle to the side, preventing it from reaching the surface being coated.
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13. An improved low defect deposition tool, comprising:
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a vacuum chamber;
a first ion gun fixedly attached within said vacuum chamber;
a sputter target fixedly attached within said vacuum chamber in the path of an ion beam produced by said ion gun, wherein said ion beam will produce a sputter plume from said target;
a substrate fixedly attached within said chamber and positioned within the path of said sputter plume; and
a second ion gun fixedly attached within said chamber and positioned to direct a second ion beam between said sputter target and said substrate. - View Dependent Claims (14, 15, 16)
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Specification