×

Use of ion beams for protecting substrates from particulate defect contamination in ultra-low-defect coating processes

  • US 20040055871A1
  • Filed: 09/25/2002
  • Published: 03/25/2004
  • Est. Priority Date: 09/25/2002
  • Status: Abandoned Application
First Claim
Patent Images

1. A method for actively protecting a substrate from particulate contamination while a thin film is being applied to the substrate, comprising directing an intense beam of ions through the space immediately in front of a surface being coated, wherein the kinetic energy of said ions is used to deflect an approaching particle away from said substrate, preventing it from reaching the surface being coated.

View all claims
  • 3 Assignments
Timeline View
Assignment View
    ×
    ×