Method and apparatus for an improved baffle plate in a plasma processing system
First Claim
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1. An improved baffle plate in a plasma processing system comprising:
- a ring comprising an upper surface, a lower surface, an inner radial edge coupled to said upper surface and said lower surface, an outer radial edge coupled to said upper surface and said lower surface, and at least one passageway coupled to said upper surface and to said lower surface and configured to permit the flow of a gas therethrough, wherein said upper surface comprises a first mating surface proximate said outer radial edge, said lower surface comprises a second mating surface proximate said outer radial edge and a plurality of fastener mating surfaces proximate said inner radial edge, and each of said at least one passageway comprises an internal passageway surface; and
a protective barrier coupled to a plurality of exposed surfaces of said baffle plate, wherein said exposed surfaces comprise said upper surface excluding said first mating surface, said lower surface excluding said second mating surface and said plurality of fastener mating surfaces, and said internal passageway surface of each of said at least one passageway.
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Abstract
The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
94 Citations
55 Claims
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1. An improved baffle plate in a plasma processing system comprising:
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a ring comprising an upper surface, a lower surface, an inner radial edge coupled to said upper surface and said lower surface, an outer radial edge coupled to said upper surface and said lower surface, and at least one passageway coupled to said upper surface and to said lower surface and configured to permit the flow of a gas therethrough, wherein said upper surface comprises a first mating surface proximate said outer radial edge, said lower surface comprises a second mating surface proximate said outer radial edge and a plurality of fastener mating surfaces proximate said inner radial edge, and each of said at least one passageway comprises an internal passageway surface; and
a protective barrier coupled to a plurality of exposed surfaces of said baffle plate, wherein said exposed surfaces comprise said upper surface excluding said first mating surface, said lower surface excluding said second mating surface and said plurality of fastener mating surfaces, and said internal passageway surface of each of said at least one passageway. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A method of producing an improved baffle plate of a plasma processing system, said method comprising the steps:
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fabricating said baffle plate, said baffle plate comprising an upper surface, a lower surface, an inner radial edge, an outer radial edge, and at least one passageway coupled to said upper surface and to said lower surface and configured to permit the flow of a gas therethrough, wherein a portion of said upper surface comprises a first mating surface proximate said outer radial edge, a portion of said lower surface comprises a second mating surface proximate said outer radial edge and a plurality of fastener mating surfaces proximate said inner radial edge, and each of said at least one passageway comprises an internal passageway surface; and
forming a protective barrier on a plurality of exposed surfaces, said exposed surfaces comprising said upper surface of said baffle plate excluding said first mating surface;
said lower surface of said baffle plate excluding said plurality of fastener mating surfaces and said second mating surface; and
said inner passageway surface coupled to said upper surface and said lower surface. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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36. A method of producing an improved baffle plate of a plasma processing system, said method comprising the steps:
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fabricating said baffle plate, said baffle plate comprising an upper surface, a lower surface, an inner radial edge, an outer radial edge, and at least one passageway coupled to said upper surface and to said lower surface and configured to permit the flow of a gas therethrough, wherein a portion of said upper surface comprises a first mating surface proximate said outer radial edge, a portion of said lower surface comprises a second mating surface proximate said outer radial edge and a plurality of fastener mating surfaces proximate said inner radial edge, and each of said at least one passageway comprises an internal passageway surface;
anodizing said baffle plate to form a surface anodization layer on said baffle plate;
machining exposed surfaces on said baffle plate to remove said surface anodization layer, said exposed surfaces comprising said upper surface of said baffle plate excluding said first mating surface;
said lower surface of said baffle plate excluding said plurality of fastener mating surfaces and said second mating surface; and
said inner passageway surface coupled to said upper surface and said lower surface; and
forming a protective barrier on said exposed surfaces. - View Dependent Claims (37, 38, 39, 40, 41, 42, 43, 44, 45)
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46. A method of producing an improved baffle plate of a plasma processing system, said method comprising the steps:
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fabricating said baffle plate, said baffle plate comprising an upper surface, a lower surface, an inner radial edge, an outer radial edge, and at least one passageway coupled to said upper surface and to said lower surface and configured to permit the flow of a gas therethrough, wherein a portion of said upper surface comprises a first mating surface proximate said outer radial edge, a portion of said lower surface comprises a second mating surface proximate said outer radial edge and a fastener mating surface proximate said inner radial edge, and each of said at least one passageway comprises an internal passageway surface;
masking exposed surfaces on said baffle plate to prevent formation of a surface anodization layer, said exposed surfaces comprising said upper surface of said baffle plate excluding said first mating surface;
said lower surface of said baffle plate excluding said plurality of fastener mating surfaces and said second mating surface; and
said inner passageway surface coupled to said upper surface and said lower surface;
anodizing said baffle plate to form said surface anodization layer on said baffle plate;
unmasking said exposed surfaces; and
forming a protective barrier on said exposed surfaces. - View Dependent Claims (47, 48, 49, 50, 51, 52, 53, 54, 55)
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Specification