Comprehensive integrated lithographic process control system based on product design and yield feedback system
First Claim
1. A process control system comprising:
- a controller that controllably performs a fabrication process;
a process tool that obtains measurement information and is controlled by the controller; and
a monitor component that collectively analyzes the measurement information, appropriately weights the information and determines whether the fabrication process is acceptable.
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Abstract
The present invention provides systems and methods that facilitate performing fabrication process. Critical parameters are valued collectively as a quality matrix, which weights respective parameters according to their importance to one or more design goals. The critical parameters are weighted by coefficients according to information such as, product design, simulation, test results, yield data, electrical data and the like. The invention then can develop a quality index which is a composite “score” of the current fabrication process. A control system can then do comparisons of the quality index with design specifications in order to determine if the current fabrication process is acceptable. If the process is unacceptable, test parameters can be modified for ongoing processes and the process can be re-worked and re-performed for completed processes. As such, respective layers of a device can be customized for different specifications and quality index depending on product designs and yields.
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Citations
29 Claims
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1. A process control system comprising:
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a controller that controllably performs a fabrication process;
a process tool that obtains measurement information and is controlled by the controller; and
a monitor component that collectively analyzes the measurement information, appropriately weights the information and determines whether the fabrication process is acceptable. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A fabrication monitoring system comprising:
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at least one database that maintains device related information for a fabrication process for a semiconductor device;
a quality matrix generator that obtains critical parameters and develops a quality matrix based at least in part on the critical parameters and generates a quality index, the quality index being representative of a relationship of the critical parameters and expected parameters. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19)
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20. A method of performing a fabrication process on a semiconductor device comprising:
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obtaining critical parameters based on measurements of the semiconductor device;
generating a quality matrix, wherein respective points of the quality matrix comprise one of the critical parameters and a weighted coefficient; and
generating a quality index as a function of the quality matrix, the quality index indicating a collective acceptability of the fabrication process. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27)
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28. A system that facilitates a fabrication process comprising:
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means for obtaining critical parameters of the fabrication process for a semiconductor device;
means for generating a quality matrix wherein respective points of the quality matrix comprise one of the critical parameters and a weighted coefficient;
means for determining the weighted coefficients; and
means for generating a quality index as a function of the quality matrix, the quality index indicating a collective acceptability of the fabrication process. - View Dependent Claims (29)
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Specification