Activated water apparatus and methods

• US 20040069618A1
• Filed: 09/22/2003
• Published: 04/15/2004
• Est. Priority Date: 12/20/2001
• Status: Active Grant

• Current Assignee: Triaxial Energies, LLC
• Original Assignee: Hydro Enterprises, Inc.
• Inventors: Gorodkin, Mark, Paskalov, George, Sokolov, Viktor
• Granted Patent: US 7,291,314 B2
• Time in Patent Office: Days
• US Class Current: 204/193
• CPC Class Codes: A61L 2/18 Liquid substances or solutions comprising solids or dissolved gases
• CPC Class Codes: C02F 1/30 by irradiation
• CPC Class Codes: C02F 1/302 with microwaves
• CPC Class Codes: C02F 1/48 with magnetic or electric fields C02F1/46 takes precedence

Abstract

An apparatus subjects water to waves from an RF plasma. This allows continuous production of “activated water” characterized by cluster sizes below about 4 molecules per cluster, water having pH below 4 or above 10, or water having ORP of less than −350 mV or more than +800 mV. The basic frequency of the plasma is preferably between 0.44 MHz and 40.68 MHz, and the plasma is preferably modulated at a frequency between 10 kHz and 34 kHz. Flow rates typically range from 20 l/hr to about 2000 l/hr. Activated water can be used for many purposes, including antimicrobial cleaning of worktable, floor, wall, knife, transport and other surfaces, for example, in meat processing facilities and hospitals.

Claims

1. An apparatus comprising:

a wave generator that produces waves at a radio frequency;

a processing vessel that subjects water to the waves for sufficient time to produce processed water with at least one the following characteristics;

a mean cluster size of less than 4 molecules per cluster;

a measured pH of less than 4, a measured pH of greater than 10, a measured ORP of less than −

350 mV, and a measured ORP of greater than +800 mV.

2. The apparatus of claim 1 wherein the frequency is between 10 kHz and 34 kHz.

3. The apparatus of claim 1 wherein a first portion of the processed water exits a first outlet of the vessel at the pH of less than 4, and a second portion of the processed water exits a second outlet of the vessel at the measured pH of greater than 10.

4. The apparatus of claim 1, further comprising a flow path that allow the processed water to pass through the vessel at a rate of at least 20 liter/hr.

5. The apparatus of claim 4 wherein the flow paths that allow the processed water to pass through the vessel at a rate of at least 2000 liter/hr.

6. The apparatus of claim 1 wherein the wave generator comprises a plasma generator.

7. The apparatus of claim 6 wherein the plasma generator produces a cold plasma having a basic frequency of between 0.44 MHz and 40.68 MHz.

8. The apparatus of claim 7 wherein the plasma is subjected to a modulation frequency between 10 kHz and 34 kHz.

9. The apparatus of claim 8 wherein a first portion of the processed water exits a first outlet of the vessel at the pH of less than 4, and a second portion of the processed water exits a second outlet of the vessel at the measured pH of greater than 10.

10. A method of cleaning a surface having a bacterial population, comprising:

subjecting water to an RF energy source that alters a measured pH of the water to less than 4; and

applying the altered water to the surface under conditions that kill at least 80% of the bacterial population.

11. The method of claim 10 wherein the surface is located in a meat processing facility.

12. The method of claim 10 wherein the surface is located in a medical facility.

13. Continuously produced water having a measured pH of less than 4 or greater than 10.

14. The water of claim 13 comprising at least 99.9 wt % H₂O.

15. The water of claim 13 comprising less than 99.9 wt % H₂O.

16. The water of claim 13 wherein the measured pH is less than 2.5.

17. The water of claim 13 the measured pH is greater than 11.5.

18. Continuously produced water having a measured Oxidation Reduction Potential (ORP) of less than −

350 mV or more than +800 mV.