Vacuum processing device

• US 20040083970A1
• Filed: 04/01/2003
• Published: 05/06/2004
• Est. Priority Date: 10/02/2000
• Status: Abandoned Application

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Hida, Tsuyoshi, Imafuku, Kosuke
• Application Number:
  US10/398,031
• Publication Number:
  US 20040083970A1
• Time in Patent Office: Days
• US Class Current: 118/719
• CPC Class Codes: C23C 16/4404 Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
• CPC Class Codes: H01J 37/32477 characterised by the means for protecting vessels or internal parts, e.g. coatings
• CPC Class Codes: H01J 37/32743 for introducing the material into processing chamber
• CPC Class Codes: H01L 21/67126 Apparatus for sealing, encapsulating, glassing, decapsulating or the like processes H01L23/02, H01L23/28

Abstract

Maintenance work on an apparatus is facilitated, the maintenance cycle is extended and an improvement in throughput is achieved. A processing chamber 2 and an auxiliary vacuum chamber 3 are connected via a transfer port 20 formed through their wall surfaces. At the inner wall of the transfer port 20, a detachable gate liner 100 constituted of a plurality of members is installed. The maintenance work at the inner wall of the transfer port is facilitated since the gate liner 100 alone simply needs to be disengaged to be washed, replaced or the like. Insulating films 200 and 300 constituted of a rare earth oxide spray-deposit film with high plasma erosion resistance are used to coat the surface of the gate liner 100 and the surface of a gate valve 4 over the area covering the transfer port 20. As a result, damage attributable to plasma does not occur readily at these surfaces, and the extent of metal contamination and dust generation is lowered.

Claims

1. A vacuum processing chamber comprising:

a detachable liner member provided at an inner wall of a transfer port formed at a wall surface of a vacuum processing chamber, through which a workpiece is transferred.

9. A vacuum processing apparatus according to any of claims 1 through 8, wherein:

the film thickness of said insulating film is equal to or greater than 50 μ

m and equal to or smaller than 100 μ

m.

2. A vacuum processing chamber comprising:

a detachable liner member provided at an inner wall of a transfer port formed at a wall surface of a vacuum processing chamber, through which a workpiece is transferred, wherein;

said liner member is constituted of a plurality of members.

3. A vacuum processing chamber comprising:

a detachable liner member provided at an inner wall of a transfer port formed at a wall surface of a vacuum processing chamber, through which a workpiece is transferred, wherein;

said liner member is constituted of a plurality of members; and

an insulating film is coated onto a surface of said liner member.

4. A vacuum processing chamber comprising:

a detachable liner member provided at an inner wall of a transfer port formed out a wall surface of a vacuum processing chamber, through which a workpiece is transferred, wherein;

said liner member is constituted of a plurality of members;

an insulating film is coated onto a surface of said liner member; and

said insulating film is constituted of a rare earth oxide spray-deposit film.

5. A vacuum processing chamber comprising:

a detachable liner member provided at an inner wall of a transfer port formed at a wall surface of a vacuum processing chamber, through which a workpiece is transferred, wherein;

said liner member is constituted of a plurality of members;

an insulating film is coated onto a surface of said liner member; and

said insulating film is constituted of Y₂O₃.

6. A vacuum processing chamber comprising:

a detachable liner member provided at an inner wall of a transfer port formed at a wall surface of a vacuum processing chamber, through which a workpiece is transferred, wherein;

an insulating film is coated onto a surface of said liner member.

7. A vacuum processing chamber comprising:

a detachable liner member provided at an inner wall of a transfer port formed at a wall surface of a vacuum processing chamber, through which a workpiece is transferred, wherein;

an insulating film is coated onto a surface of said liner member; and

said insulating film is constituted of a rare earth oxide spray-deposit film.

8. A vacuum processing chamber comprising:

a detachable liner member provided at an inner wall of a transfer port formed at a wall surface of a vacuum processing chamber, through which a workpiece is transferred, wherein;

an insulating film is coated onto a surface of said liner member; and

said insulating film is constituted of Y₂O₃.

10. A vacuum processing apparatus comprising a gate valve that opens/closes a transfer port formed at a wall surface of a vacuum processing chamber, through which a workpiece is transferred, wherein:

a rare earth oxide spray-deposit film is formed at a surface of said gate valve over, at least, an area thereof covering said transfer port.

12. A vacuum processing apparatus according to claim 10 or 11, wherein:

the film thickness of said rare earth oxide spray-deposit film is equal to or greater than 50 μ

m and equal to or smaller than 100 μ

m.

11. A vacuum processing apparatus comprising a gate valve that opens/closes a transfer port formed at a wall surface of a vacuum processing chamber, through which a workpiece is transferred, wherein:

a rare earth oxide spray-deposit film is formed at a surface of said gate valve over, at least, an area thereof covering said transfer port; and

said rare earth oxide spray-deposit film is constituted of Y₂O₃.