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Precursor for chemical vapor deposition and thin film formation process using the same

  • US 20040086643A1
  • Filed: 11/05/2002
  • Published: 05/06/2004
  • Est. Priority Date: 11/05/2002
  • Status: Abandoned Application
First Claim
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1. A precursor for chemical vapor deposition comprising a metal compound represented by formula (I):

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