Lithographic apparatus, device manufacturing method and device manufactured thereby

• US 20040100623A1
• Filed: 08/11/2003
• Published: 05/27/2004
• Est. Priority Date: 08/03/2000
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Bisschops, Theodorus Hubertus Josephus
• Granted Patent: US 6,930,753 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/708 Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
• CPC Class Codes: G03F 7/70891 Temperature

Abstract

A lithographic projection apparatus including at least one temperature control member that at least partly surrounds at least one component selected from a group comprising mask and substrate tables, the projection system and an isolated reference frame for controlling the temperature of the surrounded components. The surface finish of the member is chosen to help keep the components which it partly surrounds isothermal during operation.

Claims

1. A lithographic projection apparatus comprising:

a radiation system to provide a projection beam of radiation;

a support structure to support patterning structure to pattern the projection beam according to a desired pattern;

a substrate table to hold a substrate;

a projection system to project the patterned beam onto a target portion of the substrate;

a vibrationally isolated reference frame;

at least one position sensor constructed and arranged to monitor a position of at least one of the patterning structure and substrate mounted on the reference frame; and

at least one temperature control member operatively associated with at least one component selected from a group comprising said support structure, said substrate table, said projection system and said isolated reference frame and comprising a low emissivity surface finish such that said at least one component is maintained substantially isothermal during operation.