Automated creation of metrology recipes

• US 20040102934A1
• Filed: 11/21/2002
• Published: 05/27/2004
• Est. Priority Date: 11/21/2002
• Status: Active Grant

• Current Assignee: Synopsys Merger Holdings LLC (Synopsys Incorporated)
• Original Assignee: Numerical Technologies Inc. (Synopsys Incorporated)
• Inventors: Chang, Fang-Cheng
• Granted Patent: US 7,457,736 B2
• Time in Patent Office: Days
• US Class Current: 703/1
• CPC Class Codes: G03F 7/70525 Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
• CPC Class Codes: G03F 7/70625 Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness

Abstract

An automated metrology recipe set up process is described for a manufacturing process, in which patterns to be formed on a device are defined using a design database. The design database is processed to produce a simulated image of a feature for use in a metrology tool for a measurement of the feature. The simulated image is supplied to the metrology tool, where it is used as a basis for alignment of the tool for the measurement. Other recipe data is combined with the simulated image to provide a fully automated metrology set up process.

Claims

1. A method for setting up a metrology tool used to measure features of a device, comprising:

processing a design database characterizing features on the device to produce a simulated image of a feature for use in the metrology tool for a measurement of the feature; and

supplying the simulated image to the metrology tool.

2. The method of claim 1, including:

using the simulated image as a basis for image recognition for alignment of the metrology tool.

3. The method of claim 1, including:

using the simulated image as a basis for image recognition for alignment of the metrology tool; and

capturing a measurement using the metrology tool.

4. The method of claim 1, including:

generating a simulation of said feature; and

processing said simulation of said feature according to parameters of the metrology tool to render the simulated image.

5. The method of claim 1, wherein said processing the design database to produce a simulated image includes applying parameters of the metrology tool in combination with the design database to render the simulated image.

6. The method of claim 1, including:

providing recipe data in addition to the simulated image for use by the metrology tool.

7. A method for setting up a metrology tool used to measure features of a device, comprising:

processing a design database characterizing features on the device to produce recipe data for the metrology tool for measurements of a set of selected features on the device, the recipe data for a selected feature including a location on the selected feature for said measurement and at least one of a simulated image of the selected feature and a pointer to said simulated image; and

storing the recipe data in a machine readable medium accessible to the metrology tool, for measurements using the metrology tool.

8. The method of claim 7, including transmitting the recipe data to the metrology tool via a data communication medium in response to a request.

9. The method of claim 7, including applying rules that filter features in the design database according to characteristics of the features to identify features in the set of selected features.

10. The method of claim 7, including:

storing an image of at least one of the features in the set of selected features, and wherein said recipe data includes at least one of said stored image and a pointer to said stored image.

11. The method of claim 7, including applying rules that filter features in the design database according to characteristics of the features to produce a set of candidate features for the set of selected features, wherein said rules include a rule that specifies halos for corresponding features in the design database, the halo corresponding to a particular feature characterizing an area surrounding the particular feature, and that identifies features in the design database for which another feature overlaps the halo of the particular feature.

12. The method of claim 7, including:

simulating an image of at least one of the features in the set of selected features, storing the simulated image.

13. The method of claim 7, wherein said metrology tool comprises a scanning electron microscope, and including

using the simulated image from the recipe data for alignment of the scanning electron microscope during set up for a measurement of the feature.

14. The method of claim 7, including providing a representative image of the device, and presenting the representative image of the device to a user with a graphical user interface by which features in the set of selected features may be selected.

15. The method of claim 7, including applying rules that filter features in the design database according to characteristics of the features to produce a set of candidate features, presenting representative images of the set of candidate features to a user with a graphical user interface by which features in the set of selected features may be selected.

16. The method of claim 7, wherein using the set of locations includes:

reading recipe data for a feature in said set of selected features;

using the recipe data, driving the metrology tool to a location indicated in the recipe data;

capturing a measurement at the location; and

repeating said reading, driving and capturing until measurements of said set of selected features is completed on the device.

17. The method of claim 7, wherein said device comprises a part of a wafer including a plurality of devices, and using the set of locations includes:

reading recipe data for a feature in said set of selected features;

using the recipe data, driving the metrology tool to a location indicated in the recipe data;

capturing a measurement at the location;

repeating said reading, driving and capturing until measurements of said set of selected features is completed on the device; and

driving the metrology tool to another device on the wafer.

18. The method of claim 7, wherein using the set of locations includes:

reading recipe data for a feature in said set of selected features;

using the recipe data, driving the metrology tool to a location indicated in the recipe data;

using the simulated image as a basis for image recognition for alignment of the metrology tool; and

capturing a measurement at the location.

19. The method of claim 7, wherein said design database comprises a hierarchical design data base, with nodes in the hierarchy corresponding with features of said device, and including linking said recipe data for the set of selected features, with corresponding nodes in the hierarchy.

20. A method for setting up recipes for a metrology tool used to measure features of a device characterized by a design database, comprising:

identifying a set of selected features on the device;

simulating an image of at least one feature in said set of selected features using said design database;

providing recipe data for said set of selected features, the recipe data for said at least one feature including location data and one of said image and a pointer to said image; and

storing the recipe data in a machine readable medium for use by a metrology tool.

21. A method for setting up a metrology tool used to measure features of a device, comprising:

processing a design database characterizing features on the device to identify a set of candidate features for metrology;

presenting the set of candidate features to a user with a graphical user interface by which features from the set of candidate features are selected;

for features selected from the set of candidate features, presenting an image of a selected feature to the user with a graphical user interface by which a location for measurement on the selected feature is set, and providing recipe data for measurements of the selected feature, the recipe data including the location for measurement and one of an image of the feature and a pointer to an image of the feature; and

storing the recipe data for selected features in memory accessible by the metrology tool.

22. The method of claim 21, including transmitting the recipe data to the metrology tool via a data communication medium in response to a request.

23. The method of claim 21, wherein processing the design database includes applying rules that filter features in the design database according to characteristics of the features to identify features in the candidate set of features.

24. The method of claim 21, wherein processing the design database includes applying rules that filter features in the design database according to characteristics of the features to produce the set of candidate features, wherein said rules including a rule that specifies halos for corresponding features in the design database, the halo corresponding to a particular feature characterizing an area surrounding the particular feature, and that identifies features in the design database for which another feature overlaps the halo of the particular feature.

25. The method of claim 21, wherein said metrology tool comprises a scanning electron microscope, and including

using the stored image from the recipe data for alignment of the scanning electron microscope during set up for a measurement of the feature.

26. The method of claim 21, including:

reading recipe data for a feature in said selected features;

using the recipe data, driving the metrology tool to a location indicated in the recipe data;

capturing a measurement at the location; and

repeating said reading, driving and capturing until measurements of said selected features is completed on the device.

27. The method of claim 26, wherein said device comprises a part of a wafer including a plurality of devices, and including:

driving the metrology tool to another device on the wafer.

28. The method of claim 21, wherein said design database comprises a hierarchical design data base, with nodes in the hierarchy corresponding with features of said device, and including linking said recipe data for the set of selected features, with corresponding nodes in the hierarchy.

29. A data processing system, including:

a data processor; and

a memory system, in communication with the data processor, the memory system storing a design database characterizing features of a device, and programs of instruction executable by the data processor, the programs of instruction including simulation code for simulating images of features, and code that processes the design database to produce recipe data for measurements of a set of selected features on the device, the recipe data for a particular feature in the selected set including a measurement location on the device for said measurement and one of a simulated image of the particular feature and a pointer to a simulated image; and

that stores the recipe data in the memory system for measurements using a metrology tool.

30. The system of claim 29, including a metrology tool, and a data communication medium coupled to the metrology tool and the memory system, the metrology tool including client logic to request recipe data from the memory system.

31. The system of claim 29, the programs of instruction including logic applying rules that filter features in the design database according to characteristics of the features to identify features in the set of selected features.

32. The system of claim 29, the programs of instruction including logic storing an image of at least one of the features in the set of selected features, and wherein said recipe data includes at least one of said stored image and a pointer to said stored image.

33. The system of claim 29, the programs of instruction including logic applying rules that filter features in the design database according to characteristics of the features to produce a set of candidate features for the set of selected features, wherein said rules include a rule that specifies halos for corresponding features in the design database, the halo corresponding to a particular feature characterizing an area surrounding the particular feature, and that identifies features in the design database for which another feature overlaps the halo of the particular feature.

34. The system of claim 29, the programs of instruction including logic simulating an image of at least one of the features in the set of selected features, storing the simulated image, and wherein said recipe data includes at least one of said stored simulated image and a pointer to said stored simulated image.

35. The system of claim 29, the programs of instruction including logic:

capturing an image of at least one of the features in the set of selected features from a device, storing the captured image, and wherein said recipe data includes at least one of said stored captured image and a pointer to said stored captured image.

36. The system of claim 29, wherein said metrology tool comprises a scanning electron microscope, and the programs of instruction include logic

storing an image of at least one of the features in the set of selected features, and wherein said recipe data includes at least one of said stored image and a pointer to said stored image, and

using the stored image from the recipe data for alignment of the scanning electron microscope during set up for a measurement of the feature.

37. The system of claim 29, the programs of instruction including logic providing a representative image of the device, and presenting the representative image of the device to a user with a graphical user interface by which features in the set of selected features may be selected.

38. The system of claim 29, the programs of instruction including applying rules that filter features in the design database according to characteristics of the features to produce a set of candidate features, presenting representative images of the set of candidate features to a user with a graphical user interface by which features in the set of selected features may be selected.

39. The system of claim 29, the programs of instruction including logic:

reading recipe data for a feature in said set of selected features;

using the recipe data, driving the metrology tool to a location indicated in the recipe data;

capturing a measurement at the location; and

repeating said reading, driving and capturing until measurements of said set of selected features is completed on the device.

40. The system of claim 39, wherein said device comprises a part of a wafer including a plurality of devices, and the programs of instruction include logic:

driving the metrology tool to another device on the wafer.

41. The system of claim 29, wherein the recipe data includes a stored image of the feature, and the programs of instruction include logic using the stored image as a basis for image recognition for alignment of the metrology tool.

42. The system of claim 29, wherein said design database comprises a hierarchical design data base, with nodes in the hierarchy corresponding with features of said device, and the programs of instruction include logic linking said recipe data for the set of selected features, with corresponding nodes in the hierarchy.

43. A metrology system, including:

a communication network;

a metrology tool, including a controller coupled to the communication network;

a data processor coupled to the communication network; and

a memory system, in communication with the data processor and the metrology tool, the memory system storing a design database characterizing features of a device, and programs of instruction executable by the data processor and the controller for the metrology tool, the programs of instruction including simulation code for simulating images of features, and code that processes the design database to produce recipe data for measurements of a set of selected features on the device, the recipe data for a particular feature in the selected set including a measurement location on the device for said measurement and one of a simulated image of the particular feature and a pointer to a simulated image; and

that stores the recipe data in the memory accessible by the metrology tool for measurements using the metrology tool.

44. The system of claim 43, the programs of instruction including logic applying rules that filter features in the design database according to characteristics of the features to identify features in the set of selected features.

45. The system of claim 43, the programs of instruction including logic storing an image of at least one of the features in the set of selected features, and wherein said recipe data includes at least one of said stored image and a pointer to said stored image.

46. The system of claim 43, the programs of instruction including logic applying rules that filter features in the design database according to characteristics of the features to produce a set of candidate features for the set of selected features, wherein said rules include a rule that specifies halos for corresponding features in the design database, the halo corresponding to a particular feature characterizing an area surrounding the particular feature, and that identifies features in the design database for which another feature overlaps the halo of the particular feature.

47. The system of claim 43, the programs of instruction including logic simulating an image of at least one of the features in the set of selected features, storing the simulated image, and wherein said recipe data includes at least one of said stored simulated image and a pointer to said stored simulated image.

48. The system of claim 43, the programs of instruction including logic:

capturing an image of at least one of the features in the set of selected features from a device, storing the captured image, and wherein said recipe data includes at least one of said stored captured image and a pointer to said stored captured image.

49. The system of claim 43, wherein said metrology tool comprises a scanning electron microscope, and the programs of instruction include logic

storing an image of at least one of the features in the set of selected features, and wherein said recipe data includes at least one of said stored image and a pointer to said stored image, and

using the stored image from the recipe data for alignment of the scanning electron microscope during set up for a measurement of the feature.

50. The system of claim 43, the programs of instruction including logic providing a representative image of the device, and presenting the representative image of the device to a user with a graphical user interface by which features in the set of selected features may be selected.

51. The system of claim 43, the programs of instruction including applying rules that filter features in the design database according to characteristics of the features to produce a set of candidate features, presenting representative images of the set of candidate features to a user with a graphical user interface by which features in the set of selected features may be selected.

52. The system of claim 43, the programs of instruction including logic:

reading recipe data for a feature in said set of selected features;

using the recipe data, driving the metrology tool to a location indicated in the recipe data;

capturing a measurement at the location; and

repeating said reading, driving and capturing until measurements of said set of selected features is completed on the device.

53. The system of claim 52, wherein said device comprises a part of a wafer including a plurality of devices, and the programs of instruction include logic:

driving the metrology tool to another device on the wafer.

54. The system of claim 43, wherein the recipe data includes a stored image of the feature, and the programs of instruction include logic using the stored image as a basis for image recognition for alignment of the metrology tool.

55. The system of claim 43, wherein said design database comprises a hierarchical design data base, with nodes in the hierarchy corresponding with features of said device, and the programs of instruction include logic linking said recipe data for the set of selected features, with corresponding nodes in the hierarchy.

56. An article of manufacture providing computer programs for setting up a metrology tool for measurement of features on a device, the device being characterized by a design database characterizing features of a device, comprising:

a machine readable data storage medium storing programs of instruction executable by a data processor in one of a workstation and a controller for the metrology tool, the programs of instruction including simulation code for simulating images of features, and code that processes the design database to produce recipe data for measurements of a set of selected features on the device, the recipe data for a particular feature in the selected set including a measurement location on the device for said measurement and one of a simulated image of the particular feature and a pointer to a simulated image; and

that stores the recipe data in the memory accessible by the metrology tool for measurements using the metrology tool.

57. The article of claim 56, the programs of instruction including logic applying rules that filter features in the design database according to characteristics of the features to identify features in the set of selected features.

58. The article of claim 56, the programs of instruction including logic storing an image of at least one of the features in the set of selected features, and wherein said recipe data includes at least one of said stored image and a pointer to said stored image.

59. The article of claim 56, the programs of instruction including logic applying rules that filter features in the design database according to characteristics of the features to produce a set of candidate features for the set of selected features, wherein said rules include a rule that specifies halos for corresponding features in the design database, the halo corresponding to a particular feature characterizing an area surrounding the particular feature, and that identifies features in the design database for which another feature overlaps the halo of the particular feature.

60. The article of claim 56, the programs of instruction including logic simulating an image of at least one of the features in the set of selected features, storing the simulated image, and wherein said recipe data includes at least one of said stored simulated image and a pointer to said stored simulated image.

61. The article of claim 56, the programs of instruction including logic:

capturing an image of at least one of the features in the set of selected features from a device, storing the captured image, and wherein said recipe data includes at least one of said stored captured image and a pointer to said stored captured image.

62. The article of claim 56, the programs of instruction including logic providing a representative image of the device, and presenting the representative image of the device to a user with a graphical user interface by which features in the set of selected features may be selected.

63. The article of claim 56, the programs of instruction including applying rules that filter features in the design database according to characteristics of the features to produce a set of candidate features, presenting representative images of the set of candidate features to a user with a graphical user interface by which features in the set of selected features may be selected.

64. The article of claim 56, wherein said design database comprises a hierarchical design data base, with nodes in the hierarchy corresponding with features of said device, and the programs of instruction include logic linking said recipe data for the set of selected features, with corresponding nodes in the hierarchy.

65. A semiconductor manufacturing method, including:

forming a structure having a plurality of features on a wafer with processing equipment using lithographic processes;

loading the wafer in a metrology tool;

reading recipe data for a feature of said structure in a set of selected features;

aligning the metrology tool for a measurement on the feature using the recipe data, the recipe data including a simulated image of the feature supporting said alignment;

capturing results of the measurement;

repeating the reading, aligning and capturing steps for the set of selected features;

processing the captured results for process control in the processing equipment.

66. The manufacturing method of claim 65, including:

processing a design database characterizing features on the device to produce recipe data for measurements of said set of selected features, the recipe data for a selected feature including a location on the selected feature for said measurement and said simulated image.