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Plasma processing system and method

  • US 20040104681A1
  • Filed: 11/25/2003
  • Published: 06/03/2004
  • Est. Priority Date: 11/26/2002
  • Status: Abandoned Application
First Claim
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1. A plasma processing system comprising:

  • a chamber containing a plasma processing region;

    a chuck, configured to support a substrate within the chamber in the processing region;

    a plasma generator in communication with the chamber, the plasma generator being configured to generate a plasma during a plasma process in the plasma processing region;

    a magnetic field generator configured to produce a magnetic field in the chamber;

    a sheet optic element in communication with the chamber, the sheet optic element being configured to produce a light sheet capable of illuminating particles in the chamber;

    an imaging device configured to acquire image data corresponding to the particles illuminated by the light sheet, wherein the magnetic field generator, the sheet optic element and the imaging device are positioned relative to one another to access the plasma; and

    an image processor in communication with the imaging device, the image processor being configured to process the image data so as to obtain a concentration of particles in the light sheet.

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