Plasma processing system and method
First Claim
1. A plasma processing system comprising:
- a chamber containing a plasma processing region;
a chuck, configured to support a substrate within the chamber in the processing region;
a plasma generator in communication with the chamber, the plasma generator being configured to generate a plasma during a plasma process in the plasma processing region;
a magnetic field generator configured to produce a magnetic field in the chamber;
a sheet optic element in communication with the chamber, the sheet optic element being configured to produce a light sheet capable of illuminating particles in the chamber;
an imaging device configured to acquire image data corresponding to the particles illuminated by the light sheet, wherein the magnetic field generator, the sheet optic element and the imaging device are positioned relative to one another to access the plasma; and
an image processor in communication with the imaging device, the image processor being configured to process the image data so as to obtain a concentration of particles in the light sheet.
2 Assignments
0 Petitions
Accused Products
Abstract
A plasma processing system includes a magnetic field generator that can produce a magnetic field and a sheet optic element that can produce a light sheet capable of illuminating particles in a processing chamber of the system. An imaging device can acquire image data corresponding to the particles illuminated by the light sheet. The magnetic field generator, the sheet optic element and the imaging device can be positioned relative to one another to access the plasma. An image processor can process the image data so as to obtain the concentration of particles in the light sheet. A method of measuring particle concentration in a plasma processing system includes positioning the magnetic field generator, a sheet optic element and an imaging device relative to one another to access the plasma and obtaining the concentration of particles in the light sheet. A method of minimizing particles in the chamber is also provided.
-
Citations
58 Claims
-
1. A plasma processing system comprising:
-
a chamber containing a plasma processing region;
a chuck, configured to support a substrate within the chamber in the processing region;
a plasma generator in communication with the chamber, the plasma generator being configured to generate a plasma during a plasma process in the plasma processing region;
a magnetic field generator configured to produce a magnetic field in the chamber;
a sheet optic element in communication with the chamber, the sheet optic element being configured to produce a light sheet capable of illuminating particles in the chamber;
an imaging device configured to acquire image data corresponding to the particles illuminated by the light sheet, wherein the magnetic field generator, the sheet optic element and the imaging device are positioned relative to one another to access the plasma; and
an image processor in communication with the imaging device, the image processor being configured to process the image data so as to obtain a concentration of particles in the light sheet. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40)
-
-
41. A method of measuring particle concentration in a plasma processing system having a chamber containing a plasma processing region in which a plasma can be generated during a plasma process to process a substrate and a magnetic field generator configured to produce a magnetic field in the chamber, the method comprising:
-
positioning the magnetic field generator, a sheet optic element and an imaging device relative to one another to access the plasma;
producing a light sheet to illuminate particles in the chamber with the sheet optic element;
acquiring image data corresponding to the illuminated particles with the imaging device; and
obtaining a concentration of particles in the light sheet. - View Dependent Claims (42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53)
-
-
54. A method of minimizing a particle concentration in a plasma processing chamber of a plasma processing system comprising:
-
positioning a substrate or wafer in a plasma processing chamber to be processed with a plasma;
performing a plasma process on the substrate or wafer;
obtaining a concentration of particles in the chamber; and
modifying the plasma process to reduce particles to a predetermined level within in the chamber. - View Dependent Claims (55, 56, 57, 58)
-
Specification