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Fluoride in supercritical fluid for photoresist and residue removal

  • US 20040112409A1
  • Filed: 12/16/2002
  • Published: 06/17/2004
  • Est. Priority Date: 12/16/2002
  • Status: Abandoned Application
First Claim
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22. A system for cleaning a substrate, the system comprising a chamber for generating a supercritical solution comprising:

  • a. supercritical CO2;

    b. an amine comprising at least one organo group; and

    c. hydrogen fluoride, wherein the at least a portion of the hydrogen fluoride and the amine form an ammonium fluoride adduct.

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