Lithographic apparatus and method to determine beam characteristics
First Claim
1. A lithographic apparatus comprising:
- an illuminator configured to provide a beam of radiation;
a support structure configured to hold a patterning device, the patterning device configured to pattern the beam according to a desired pattern;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate;
an aperture configured to permit propagation of the beam of radiation therethrough;
a detector configured to detect an intensity of at least part of the beam of radiation propagating through the aperture; and
a processor configured to vary the intensity of the radiation beam through the aperture by a relative movement of the radiation beam and the aperture and to calculate a beam size of the radiation beam from the detected intensity and relative movement.
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Accused Products
Abstract
A lithographic apparatus is provided that has an aperture, a detector configured to detect an intensity of a radiation beam directed through the aperture and a processor configured to vary the intensity of the radiation beam through the aperture by a relative movement of the radiation beam and the aperture and to calculate a beam size of the radiation beam from the detected intensity and relative movement. Alternatively or in addition, a lithographic apparatus may include a focusing element configured to focus a part of a radiation beam in a focus plane, an aperture arranged in the focus plane of the focusing element, a detector configured to detect an intensity of the part of the radiation beam through the aperture, and a processor configured to vary the intensity of the radiation beam through the aperture by a change in a pointing direction of the radiation beam and to calculate a beam divergence of the radiation beam from the detected intensity and pointing direction. The apparatus offers a means to determine beam quality characteristics such as beam size and/or beam divergence.
12 Citations
31 Claims
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1. A lithographic apparatus comprising:
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an illuminator configured to provide a beam of radiation;
a support structure configured to hold a patterning device, the patterning device configured to pattern the beam according to a desired pattern;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate;
an aperture configured to permit propagation of the beam of radiation therethrough;
a detector configured to detect an intensity of at least part of the beam of radiation propagating through the aperture; and
a processor configured to vary the intensity of the radiation beam through the aperture by a relative movement of the radiation beam and the aperture and to calculate a beam size of the radiation beam from the detected intensity and relative movement. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A lithographic apparatus comprising:
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an illuminator configured to provide a beam of radiation;
a support structure configured to hold a patterning device, the patterning device configured to pattern the beam according to a desired pattern;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate;
a focusing element configured to focus a part of the radiation beam in a focus plane;
an aperture arranged in the focus plane of the focusing element;
a detector configured to detect an intensity of the part of the radiation beam propagating through the aperture; and
a processor configured to vary the intensity of the radiation beam through the aperture by a change in a pointing direction of the radiation beam and to calculate a beam divergence of the radiation beam from the detected intensity and pointing direction. - View Dependent Claims (14, 15, 16, 17, 18)
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19. A method of determining a beam size of a radiation beam in a lithographic apparatus, the method comprising:
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changing a position of the radiation beam relative to an aperture through which the radiation beam propagates;
detecting the intensity of at least part of the radiation beam propagating through the aperture relative to a maximum intensity as a function of relative movement of the radiation beam; and
calculating the beam size of the radiation beam from the detected intensity as a function of the relative movement. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27)
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28. A method of determining a beam divergence of a radiation beam in a lithographic apparatus, the method comprising:
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focusing a part of the radiation beam in a focus plane, an aperture being provided in the focus plane;
changing a pointing direction of the radiation beam;
detecting the intensity of the part of the radiation beam propagating through the aperture relative to a maximum intensity as a function of the pointing direction of the radiation beam; and
calculating the beam divergence of the radiation beam from the detected intensity as a function of the pointing direction. - View Dependent Claims (29, 30, 31)
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Specification