Method for depositing a film on a substrate

• US 20040115361A1
• Filed: 09/02/2003
• Published: 06/17/2004
• Est. Priority Date: 09/03/2002
• Status: Abandoned Application

• Current Assignee: Corning Incorporated
• Original Assignee: Corning Incorporated
• Inventors: Putz, Jorg, Aegerter, Michel A., Guzman, Guillaume
• Application Number:
  US10/654,460
• Publication Number:
  US 20040115361A1
• Time in Patent Office: Days
• US Class Current: 427/430.1
• CPC Class Codes: B05D 1/18 performed by dipping
• CPC Class Codes: B05D 3/0254 After-treatment
• CPC Class Codes: C03C 17/001 General methods for coating; Devices therefor
• CPC Class Codes: C03C 17/002 for flat glass, e.g. float glass
• CPC Class Codes: C03C 17/253 Coating containing SnO2
• CPC Class Codes: C03C 2218/113 by sol-gel processes
• CPC Class Codes: H01L 31/1884 Manufacture of transparent electrodes, e.g. TCO, ITO
• CPC Class Codes: H10K 71/10 Deposition of organic active material
• CPC Class Codes: H10K 99/00 Subject matter not provided for in other groups of this subclass
• CPC Class Codes: Y02E 10/50 Photovoltaic [PV] energy

Abstract

A process for depositing a layer of product on at least part of a major surface of a substrate having two sides separated by a thickness of less than about 3 mm is provided. The process involves using an immersion technique, in which the substrate is placed in a liquid medium containing a solution or dispersion of the product to be deposited or one of its precursors; removed from the liquid medium such that the substrate is coated with a liquid layer, and at least part of the liquid medium contained in the deposited liquid layer is evaporated, wherein the process is characterized as being carried out under conditions in which cooling of the substrate as a result of evaporation of said part of the liquid medium is limited

An advantageous variant of the process involves in heating the immersion bath to a temperature that is sufficient to at least partially compensate for substrate cooling resulting from evaporation of the liquid medium. The inventive process can be used advantageously for depositing a solid layer by means of a sol-gel type process.

Claims

1. A method for depositing a layer of product on at least a part of a substrate surface, said substrate having two sides separated by a thickness of less than about 3 mm, the method comprising:

immersing said substrate in a liquid medium containing a solution or dispersion of said product to be deposited or a precursors of said product;

removing said substrate from said liquid medium; and

evaporating at least part of the liquid medium contained in the deposited liquid layer from said substrate surface, wherein said process is carried out under conditions in which cooling of the substrate as a result of said evaporation of said part of the liquid medium is limited.

2. The method according to claim 1, wherein said liquid medium has a composition of so as to reduce its heat of evaporation and/or rate of evaporation.

3. The method according to claim 1, wherein for a given liquid medium, the method is carried out by at least partially compensating for substrate cooling resulting from evaporation of the liquid medium.

4. The method according to claim 3, wherein said solution or dispersion is heated to a temperature sufficient to at least partially compensate for substrate cooling by evaporation.

5. The method according to claim 3, wherein said substrate coated with a liquid layer is heated to a temperature sufficient to at least partially compensate for its cooling as a result of evaporation of said liquid medium contained in said liquid layer.

6. The method according to claim 1, wherein a sol-gel type process is used to deposit.

7. The method according to claim 1, wherein said solution or dispersion is a dispersion or solution of a simple oxide, a mixed oxide or mixture of oxides, said oxides possibly being doped, or a precursor of these oxides consisting, in particular, of polymer particles or chains based on these oxides onto which are grafted organic radicals such as C₁ to C₁₀ alkyl groups, carboxylate groups, acetate groups or phenyl radicals.

8. The method according to claim 7, wherein said layer is a metal oxide layer, mixed metal oxide layer or mixture of metal oxides, said metal being doped or not with a metal.

9. The method according to claim 8, wherein said metal oxides are transparent and conducting.

10. The method according to claim 1, wherein said substrate is a glass, vitroceramic, metal, metalloid, or polymer-based substrate.

11. The method according to claim 10, wherein the substrate is a glass or vitroceramic substrate whose thickness is less than 1 mm.

12. The method according to claim 1, wherein said substrate is a glass or vitroceramic substrate whose thickness is less than 1 mm and is coated with a transparent and conducting metal oxide layer.

13. The method according to claim 12, wherein said transparent and conducting metal oxide layer is a layer of indium oxide doped with tin (In₂O₃:

Sn).

14. The method according to claim 12, wherein a sol-gel process is used to deposit a layer of tin oxide doped with antimony (SnO₂:

Sb) on said glass or vitroceramic substrate previously coated with a layer of indium oxide doped with tin.