Affinity based self-assembly systems and devices for photonic and electronic applications

• US 20040115696A1
• Filed: 07/31/2003
• Published: 06/17/2004
• Est. Priority Date: 12/06/1996
• Status: Abandoned Application

• Current Assignee: Nanotronics Incorporated
• Original Assignee: Nanotronics Incorporated
• Inventors: Heller, Michael J.
• Application Number:
  US10/632,255
• Publication Number:
  US 20040115696A1
• Time in Patent Office: Days
• US Class Current: 435/6
• CPC Class Codes: B01J 19/0046 Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays synthesis methods per se C40B50/00
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• CPC Class Codes: B01L 3/502715 : characterised by interfacing components, e.g. fluidic, electrical, optical or mechanical interfaces
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Abstract

This invention relates to methodologies and techniques that utilize programmable functionalized self-assembling nucleic acids, nucleic acid modified structures, and other selective affinity or binding moieties as building blocks for creating molecular electronic and photonic mechanisms; organizing, assembling, and interconnecting nanostructures, submicron- and micron-sized components onto silicon or other materials; organizing, assembling, and interconnecting nanostructures, submicron- and micron-sized components within perimeters of microelectronic or optoelectronic components/devices; and creating and manufacturing photonic and electronic structures, devices, and systems. In one aspect of this invention, a method for forming a multiple identity substrate material is provided comprising the steps of: providing a first affinity sequence at multiple locations on a support, providing a functionalized second affinity sequence, which reacts with the first affinity sequence, and has an unhybridized overhang sequence, and selectively cross-linking first affinity sequences and second affinity sequences.

Claims

1. A method for forming a multiple identity substrate material comprising the steps of:

providing a first affinity sequence at multiple locations on a support;

providing a functionalized second affinity sequence, which reacts with the first affinity sequence, and has an unhybridized overhang sequence; and

selectively cross-linking first affinity sequences and second affinity sequences.

2. The method of claim 1, wherein the cross-linking is performed by UV irradiation of psoralen.

3. The method of claim 1, wherein at least one location on the support with the first affinity sequence is masked to prevent cross-linking of the first and second affinity sequences.

4. The method of claim 1, wherein the first affinity sequence is covalently attached to the support.

5. The method of claim 4, wherein the support is reacted with aminopropyltriethoxysilane (APS) reagent before the first affinity sequence is attached.

6. The method of claim 4, wherein the first affinity sequence is reacted to form a dialdehyde group at a terminal position of the first affinity sequence.

7. The method of claim 1, further comprising the steps of:

dehybridizing the second affinity sequences that are not cross-linked;

providing a functionalized third affinity sequence, which reacts with the second affinity sequence, and has an unhybridized overhang sequence; and

selectively cross-linking the second and third affinity sequences.

9. The method of claim 7, wherein at least one location on the support is masked to prevent cross-linking of the second and third affinity sequences.

10. The method of claim 1, further comprising providing a fourth affinity sequence that hybridizes with the first affinity sequence and includes a fluorescent label.

11. The method of claim 1, further comprising providing a fifth affinity sequence that hybridizes with the second affinity sequence and includes a fluorescent label.

12. The method of claim 7, further comprising a sixth affinity sequence that hybridizes with the third affinity sequence and includes a fluorescent label

8. The method of claim 8, wherein the cross-linking is performed by UV irradiation with psoralen.