Methods of fabricating devices by low pressure cold welding
First Claim
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1. A method of fabricating a device, comprising:
- depositing a metal layer over a patterned, soft elastomeric stamp; and
transferring the metal layer from the patterned, soft elastomeric stamp onto a substrate.
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Abstract
Methods of transferring a metal and/or organic layer from a patterned stamp, preferably a soft, elastomeric stamp, to a substrate are provided. The patterned metal or organic layer may be used for example, in a wide range of electronic devices. The present methods are particularly suitable for nanoscale patterning of organic electronic components.
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Citations
35 Claims
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1. A method of fabricating a device, comprising:
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depositing a metal layer over a patterned, soft elastomeric stamp; and
transferring the metal layer from the patterned, soft elastomeric stamp onto a substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 35)
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27. A method of fabricating a device, comprising:
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depositing a first metal layer over a patterned, soft elastomeric stamp;
depositing a first organic layer over the first metal layer;
depositing a second metal layer over the first organic layer; and
transferring the second metal layer, the first organic layer and the first metal layer from the patterned, soft elastomeric stamp onto a substrate. - View Dependent Claims (28)
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29. A method of fabricating an organic device, comprising:
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depositing a first organic layer onto a patterned, soft elastomeric stamp; and
transferring the first organic layer from the patterned, soft elastomeric stamp onto a substrate. - View Dependent Claims (30, 31, 32, 33, 34)
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Specification