Method and apparatus for monitoring parts in a plasma in a material processing system

• US 20040128014A1
• Filed: 12/31/2002
• Published: 07/01/2004
• Est. Priority Date: 12/31/2002
• Status: Active Grant

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Klekotka, James E.
• Granted Patent: US 6,985,787 B2
• Time in Patent Office: Days
• US Class Current: 700/108
• CPC Class Codes: G05B 19/4183 characterised by data acquisition, e.g. workpiece identification
• CPC Class Codes: G05B 2219/31095 Read write intelligent chip on workpiece, pallet, tool for data exchange
• CPC Class Codes: G05B 2219/49302 Part, workpiece, code, tool identification
• CPC Class Codes: G06Q 10/087 Inventory or stock management, e.g. order filling, procurement or balancing against orders
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge
• CPC Class Codes: Y02P 90/02 Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Abstract

The present invention presents an improved apparatus and method for monitoring parts in a material processing system, wherein the material processing system includes a processing tool, a number of RF-responsive part identifiers coupled to the processing tool to generate and transmit part ID data, and a sensor interface assembly (SIA) configured to receive the part ID data from the plurality of RF-responsive part identifiers.

Claims

1. A material processing system comprising:

a processing tool, wherein the processing tool includes at least one process chamber;

a plurality of RF-responsive part identifiers coupled to the processing tool, a RF-responsive part identifier being configured to generate part ID data for the processing tool and transmit the part ID data; and

a sensor interface assembly (SIA) configured to receive the part ID data from at least one RF-responsive part identifier.

2. The material processing system as claimed in claim 1, wherein the part ID data comprises at least one of part ID number, system ID data, manufacturing data, and use data.

3. The material processing system as claimed in claim 1, wherein at least one RF-responsive part identifier comprises:

a contamination sensor for generating contamination data; and

a RF-responsive transmitter coupled to the contamination sensor for transmitting the contamination data.

4. The material processing system as claimed in claim 3, wherein the contamination data comprises at least one of exposure time, exposure strength, and exposure composition data.

5. The material processing system as claimed in claim 1, wherein at least one RF-responsive part identifier comprises:

a part identifier for generating the part ID data; and

a RF-responsive transmitter coupled to the part identifier for transmitting the part ID data.

6. The material processing system as claimed in claim 5, wherein the part identifier comprises at least one of memory, a controller, a timer, a microcontroller, and a microprocessor.

7. The material processing system as claimed in claim 1, wherein at least one RF-responsive part identifier is coupled to a chamber component.

8. The material processing system as claimed in claim 7, wherein the at least one RF-responsive part identifier comprises:

a part identifier configured to generate part ID data for the chamber component; and

a RF-responsive transmitter coupled to the part identifier for transmitting the part ID data for the chamber component.

9. The material processing system as claimed in claim 1, further comprising an upper assembly, wherein at least one RF-responsive part identifier is coupled to at least one component of the upper assembly.

10. The material processing system as claimed in claim 9, wherein the at least one RF-responsive part identifier comprises:

a part identifier configured to generate part ID data for the at least one component of the upper assembly; and

a RF-responsive transmitter coupled to the part identifier for transmitting the part ID data for the at least one component of the upper assembly.

11. The material processing system as claimed in claim 1, further comprising a substrate holder, wherein at least one RF-responsive part identifier is coupled to the substrate holder.

12. The material processing system as claimed in claim 11, wherein the substrate holder comprises at least one of a chuck, an electrostatic chuck (ESC), a shield, a focus ring, a baffle, and an electrode.

13. The material processing system as claimed in claim 11, wherein the at least one RF-responsive part identifier comprises:

a part identifier configured to generate part ID data for the substrate holder; and

a RF-responsive transmitter coupled to the part identifier for transmitting the part ID data for the substrate holder.

14. The material processing system as claimed in claim 11, wherein the at least one RF-responsive part identifier comprises:

an part identifier configured to generate part ID data for a wafer on the substrate holder; and

a RF-responsive transmitter coupled to the part identifier for transmitting the part ID data for the wafer.

15. The material processing system as claimed in claim 1, further comprising a ring, wherein at least one RF-responsive part identifier is coupled to the ring.

16. The material processing system as claimed in claim 15, wherein the ring comprises at least one of a focus ring, a shield ring, an electrode ring, and an insulator ring.

17. The material processing system as claimed in claim 15, wherein the at least one RF-responsive part identifier comprises:

a part identifier configured to generate part ID data for the ring; and

a RF-responsive transmitter coupled to the part identifier for transmitting the part ID data for the ring.

18. The material processing system as claimed in claim 1, further comprising a plate, wherein at least one RF-responsive part identifier is coupled to the plate.

19. The material processing system as claimed in claim 18, wherein the plate comprises at least one of an exhaust plate, a baffle plate, an electrode plate, and an insulator plate.

20. The material processing system as claimed in claim 18, wherein the at least one RF-responsive part identifier comprises:

a part identifier configured to generate part ID data for the plate; and

a RF-responsive transmitter coupled to the part identifier for transmitting the part ID data for the plate.

21. The material processing system as claimed in claim 5, wherein the at least one RF-responsive part identifier further comprises a timer coupled to at least one of the part identifier and the RF-responsive transmitter.

22. The material processing system as claimed in claim 5, wherein the RF-responsive transmitter comprises an antenna configured to transmit a response signal, and a transmitter coupled to the antenna, wherein the transmitter is configured to modulate and/or encode the response signal with the part ID data.

23. The material processing system as claimed in claim 5, wherein the RF-responsive part identifier further comprises a power source coupled to at least one of the part identifier and the RF-responsive transmitter

24. The material processing system as claimed in claim 23, wherein the power source comprises at least one of a RF-to-DC converter configured to convert energy emitted from a plasma related signal into a DC signal, a RF-to-DC converter configured to convert a non-plasma related signal into a DC signal, a DC-to-DC converter, and a battery.

25. The material processing system as claimed in claim 24, wherein the power source provides the DC signal to the part identifier.

26. The material processing system as claimed in claim 24, wherein the power source provides the DC signal to the RF-responsive transmitter.

27. The material processing system as claimed in claim 5, wherein the at least one RF-responsive part identifier further comprises a controller coupled to at least one of the part identifier and the RF-responsive transmitter.

28. The material processing system as claimed in claim 27, wherein the controller comprises at least one of a a microprocessor, a microcontroller, a timer, digital signal processor (DSP), memory, receiver, A/D converter, and D/A converter.

29. The material processing system as claimed in claim 1, wherein at least one RF-responsive part identifier comprises:

a part identifier for generating part ID data;

a RF-responsive transmitter coupled to the part identifier for transmitting the part ID data; and

a receiver coupled to at least one of the part identifier and the RF-responsive transmitter.

30. The material processing system as claimed in claim 29, wherein the RF-responsive transmitter comprises an antenna and a backscatter modulator.

31. The material processing system as claimed in claim 29, wherein the RF-responsive transmitter comprises an antenna configured to transmit a response signal, and a transmitter coupled to the antenna, wherein the transmitter is configured to modulate and/or encode the response signal with the part ID data.

32. The material processing system as claimed in claim 31, wherein the RF-responsive transmitter further comprises at least one of a RF-to-DC converter, a DC-to-DC converter, and a battery.

33. The material processing system as claimed in claim 29, wherein the RF-responsive part identifier further comprises at least one power source, a power source producing a DC signal using at least one of a RF-to-DC converter, a DC-to-DC converter, and a battery.

34. The material processing system as claimed in claim 29, wherein the receiver comprises an antenna and processor, the antenna being configured to receive an input signal, the processor being configured to use the input signal to generate operational data, and to use the operational data to control at least one of the RF-responsive transmitter, the receiver, and the part identifier.

35. The material processing system as claimed in claim 34, wherein the receiver further comprises at least one of a RF-to-DC converter configured to convert energy emitted from a process related signal into a DC signal, a RF-to-DC converter configured to convert a non-process related signal into a DC signal, a DC-to-DC converter, and a battery.

36. The material processing system as claimed in claim 29, wherein the at least one RF-responsive part identifier further comprises a controller coupled to at least one of the receiver, the part identifier, and the RF-responsive transmitter.

37. The material processing system as claimed in claim 36, wherein the controller comprises at least one of a microprocessor, a microcontroller, digital signal processor (DSP), memory, A/D converter, and D/A converter

38. The material processing system as claimed in claim 1, wherein at least one RF-responsive part identifier comprises:

a part identifier for generating part ID data; and

a RF-responsive transceiver coupled to the part identifier for transmitting the part ID data.

39. The material processing system as claimed in claim 38, wherein the RF-responsive transceiver comprises an antenna configured to transmit a response signal, a transmitter coupled to the antenna, wherein the transmitter is configured to modulate and/or encode the response signal with the part ID data, a second antenna, receiver, and processor, the second antenna being configured to receive an input signal, the receiver being configured to use the input signal to generate operational data, the processor being configured to use the operational data to control the RF-responsive transceiver.

40. The material processing system as claimed in claim 38, wherein the at least one RF-responsive part identifier further comprises a controller coupled to at least one of the part identifier and the RF-responsive transceiver.

41. The material processing system as claimed in claim 40, wherein the controller comprises at least one of a microprocessor, a microcontroller, digital signal processor (DSP), timer, memory, A/D converter, and D/A converter.

42. The material processing system as claimed in claim 38, wherein the at least one RF-responsive part identifier further comprises at least one power source coupled to at least one of the part identifier and the RF-responsive transceiver, a power source comprising at least one of a RF-to-DC converter, a DC-to-DC converter, and a battery.

43. The material processing system as claimed in claim 1, wherein the SIA comprises:

a receiver configured to receive a response signal containing the part ID data from at least one RF-responsive part identifier; and

a transmitter configured to transmit an input signal to the at least one RF-responsive part identifier, wherein the input signal causes the at least one RF-responsive part identifier to send the response signal to the receiver.

44. The material processing system as claimed in claim 1, wherein the material processing system further comprises:

a controller coupled to the SIA, the controller being configured to analyze the part ID data, wherein the controller compares the part ID data with target electrical performance data, and to use the comparison to change a process.

45. The material processing system as claimed in claim 1, wherein the material processing system further comprises:

a controller coupled to the SIA, the controller being configured to analyze the part ID data, wherein the controller compares the part ID data with historical part ID data, and to use the comparison to predict a fault.

46. The material processing system as claimed in claim 1, wherein the material processing system further comprises:

a controller coupled to the SIA, the controller being configured to analyze the part ID data, wherein the controller compares the part ID data with historical part ID data, and to use the comparison to declare a fault.

47. The material processing system as claimed in claim 1, wherein the material processing system further comprises:

a controller coupled to the SIA, the controller being configured to provide instructional data to the SIA.

48. The material processing system as claimed in claim 1, wherein the material processing system further comprises:

a controller coupled to the SIA, the controller being configured to analyze the part ID data and control the processing tool.

49. The material processing system as claimed in claim 1, further comprising a RF system, wherein a RF-responsive part identifier is coupled to at least one RF system component.

50. The material processing system as claimed in claim 1, further comprising a gas supply system, wherein a RF-responsive part identifier is coupled to at least one gas supply system component.

51. The material processing system as claimed in claim 1, further comprising a transfer system, wherein a RF-responsive part identifier is coupled to at least one transfer system component.

52. The material processing system as claimed in claim 1, further comprising an exhaust system, wherein a RF-responsive part identifier is coupled to at least one exhaust system component.

53. The material processing system as claimed in claim 1, wherein the material processing system further comprises:

a controller coupled to the SIA, the controller being configured to analyze the part ID data and to use the analysis results to determine when to perform maintenance on the processing tool.

54. A RF-responsive part identifier comprising:

a part identifier configured to generate part ID data for a component in a material processing system; and

a RF-responsive transmitter coupled to the part identifier for transmitting the part ID data for the component.

55. The RF-responsive part identifier as claimed in claim 54, wherein the component is part of an etching system.

56. The RF-responsive part identifier as claimed in claim 54, wherein the component is part of a deposition system.

57. The RF-responsive part identifier as claimed in claim 54, wherein the component is part of a cleaning system.

58. The RF-responsive part identifier as claimed in claim 54, wherein the component is part of a transfer system.

59. A plasma processing system comprising:

a processing tool, wherein the processing tool includes a plasma chamber;

a plurality of RF-responsive part identifiers coupled to the processing tool to generate and transmit part ID data, wherein at least one RF-responsive part identifier is coupled to the plasma chamber; and

a sensor interface assembly (SIA) configured to receive the part ID data from the plurality of RF-responsive part identifiers.

60. The material processing system as claimed in claim 59, wherein the processing system further comprises:

a controller coupled to the SIA, the controller being configured to analyze the part ID data and control the plasma processing system.

61. A method of monitoring a material processing system comprising a processing tool, wherein the processing tool includes at least one process chamber, the method comprising:

providing a RF-responsive part identifier coupled to the processing tool, wherein the RF-responsive part identifier is configured to generate and transmit part ID data; and

providing a sensor interface assembly (SIA), wherein the SIA is configured to receive the part ID data from the RF-responsive part identifier.

62. The method of monitoring a material processing system as claim in claim 61, the method further comprising:

generating the part ID data; and

transmitting the part ID data, wherein the RF-responsive part identifier receives an input signal comprising operational data and uses the operational data to transmit the part ID data using a response signal.

63. The method of monitoring a material processing system as claim in claim 61, the method further comprising:

generating part ID data; and

transmitting the part ID data, wherein the part ID data comprises contamination data that includes at least one of exposure time data, exposure strength data, and exposure composition data.

64. The method of monitoring a material processing system as claim in claim 61, wherein the method further comprises:

coupling at least one RF-responsive part identifier to a chamber component;

generating part ID data for the chamber component; and

transmitting the part ID data for the chamber component, wherein the at least one RF-responsive part identifier comprises a part identifier and a RF-responsive transmitter coupled to the part identifier.

65. The method of monitoring a material processing system as claim in claim 61, wherein the method further comprises:

coupling at least one RF-responsive part identifier to a component of an upper assembly;

generating part ID data for the component of the upper assembly; and

transmitting the part ID data for the component of the upper assembly, wherein the at least one RF-responsive part identifier comprises a part identifier and a RF-responsive transmitter coupled to the part identifier.

66. The method of monitoring a material processing system as claim in claim 61, wherein the method further comprises:

coupling at least one RF-responsive part identifier to a substrate holder;

generating part ID data for the substrate holder; and

transmitting the part ID data for the substrate holder, wherein the at least one RF-responsive part identifier comprises a part identifier and a RF-responsive transmitter coupled to the part identifier.

67. The method of monitoring a material processing system as claim in claim 61, wherein the method further comprises:

coupling at least one RF-responsive part identifier to a wafer;

generating part ID data for the wafer; and

transmitting the part ID data for the wafer, wherein the at least one RF-responsive part identifier comprises a part identifier and a RF-responsive transmitter coupled to the part identifier.

68. The method of monitoring a material processing system as claim in claim 61, wherein the method further comprises:

coupling a RF-responsive part identifier to at least one of a transfer system component, a RF system component, a gas supply system component, and an exhaust system component;

generating part ID data for the component; and

transmitting the part ID data for the component, wherein the at least one RF-responsive part identifier comprises a part identifier and a RF-responsive transmitter coupled to the part identifier.

69. The method of monitoring a material processing system as claim in claim 61, wherein the method further comprises:

coupling at least one RF-responsive part identifier to a ring;

generating part ID data for the ring; and

transmitting the part ID data for the ring, wherein the at least one RF-responsive part identifier comprises a part identifier and a RF-responsive transmitter coupled to the part identifier.

70. The method of monitoring a material processing system as claim in claim 69, wherein the ring comprises at least one of a focus ring, a shield ring, a deposition ring, an electrode ring, and an insulator ring.

71. The method of monitoring a material processing system as claim in claim 61, wherein the method further comprises:

coupling at least one RF-responsive part identifier to a plate;

generating part ID data for the plate; and

transmitting the part ID data for the plate, wherein the at least one RF-responsive part identifier comprises a part identifier and a RF-responsive transmitter coupled to the part identifier.

72. The method of monitoring a material processing system as claim in claim 71, wherein the plate comprises at least one of a baffle plate, an exhaust plate, an electrode plate, and an injection plate.

73. The method of monitoring a material processing system as claim in claim 61, wherein the method further comprises:

coupling at least one power source to a RF-responsive part identifier, wherein the RF-responsive part identifier comprises a part identifier and a RF-responsive transmitter coupled to the part identifier;

generating a DC signal; and

providing the DC signal to at least one of the RF-responsive transmitter and the part identifier.

74. The method of monitoring a material processing system as claim in claim 73, wherein the method further comprises:

generating the DC signal using at least one of a battery, filter, a RF-to-DC converter, and a DC-to-DC converter.

75. The method of monitoring a material processing system as claim in claim 61, the method further comprising:

transmitting an input signal using the SIA, the SIA comprising a transmitter, wherein the input signal comprises operational data; and

receiving the part ID data, wherein the SIA comprises a receiver configured to receive a response signal from at least one RF-responsive part identifier.

76. The method of monitoring a material processing system as claim in claim 75, the method further comprising:

generating the part ID data; and

transmitting the part ID data, wherein the RF-responsive part identifier receives the input signal and uses the operational data to transmit the part ID data using the response signal.

77. The method of monitoring a material processing system as claim in claim 61, the method further comprising:

transmitting an input signal using the SIA, the SIA comprising a transmitter, wherein the input signal comprises operational data;

receiving the input signal, wherein the RF-responsive part identifier comprises a receiver configured to receive the input signal and to obtain the operational data from the input signal;

generating the part ID data, wherein the RF-responsive part identifier comprises a part identifier configured to generate the part ID data;

transmitting the part ID data, wherein the RF-responsive part identifier comprises a transmitter configured to transmit the part ID data using a response signal; and

receiving the part ID data, the SIA comprising a receiver configured to receive the response signal from at least one RF-responsive part identifier.

78. The method of monitoring a material processing system as claim in claim 77, the method further comprising:

transmitting the input signal using the SIA when plasma is not being generated; and

receiving the input signal, when plasma is not being generated.

79. The method of monitoring a material processing system as claim in claim 77, the method further comprising:

generating the part ID data, when a process is being performed;

transmitting the response signal using the RF-responsive part identifier when plasma is not being generated; and

receiving the response signal, when plasma is not being generated.

80. The method of monitoring a material processing system as claim in claim 77, the method further comprising:

storing the part ID data, wherein the RF-responsive part identifier comprises a memory configured to store the part ID data.

81. The method of monitoring a material processing system as claim in claim 77, the method further comprising:

providing a DC signal, wherein the RF-responsive part identifier comprises a power source configured to produce the DC signal and to provide the DC signal to at least one of the RF-responsive part identifier receiver and the RF-responsive part identifier transmitter.

82. The method of monitoring a material processing system as claim in claim 81, the method further comprising:

providing a DC signal, wherein the RF-responsive part identifier comprises a power source configured to produce the DC signal by converting at least one plasma related frequency into the DC signal.

83. The method of monitoring a material processing system as claim in claim 81, the method further comprising:

providing a DC signal, wherein the RF-responsive part identifier comprises a power source configured to produce the DC signal by converting at least one non-plasma related frequency into the DC signal.

84. The method of monitoring a material processing system as claim in claim 81, the method further comprising:

providing a DC signal, wherein the RF-responsive part identifier comprises a power source configured to produce the DC signal by converting a portion of the input signal into the DC signal.