Apparatus and method for delivery of reactive chemical precursors to the surface to be treated

• US 20040129212A1
• Filed: 02/21/2003
• Published: 07/08/2004
• Est. Priority Date: 05/20/2002
• Status: Abandoned Application

• Current Assignee: Pradad N. Gadgil, Shmuel Erez
• Original Assignee: Pradad N. Gadgil, Shmuel Erez
• Inventors: Erez, Shmuel, Gadgil, Pradad N.
• Application Number:
  US10/370,883
• Publication Number:
  US 20040129212A1
• Time in Patent Office: Days
• US Class Current: 118/715
• CPC Class Codes: C23C 16/452 by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
• CPC Class Codes: C23C 16/45542 Plasma being used non-continuously during the ALD reactions
• CPC Class Codes: C23C 16/45551 for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
• CPC Class Codes: C23C 16/45578 Elongated nozzles, tubes with holes
• CPC Class Codes: C23C 16/45591 Fixed means, e.g. wings, baffles
• CPC Class Codes: H01L 21/0228 deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
• CPC Class Codes: H01L 21/3141 Deposition using atomic layer deposition techniques [ALD]

Abstract

The present invention provides an apparatus and method for radical-assisted monolayer processing in a reactor with linear injectors arranged in diametrical direction of the substrate and injecting reactive gases or radicals sequentially onto the treated substrate surface with a relative motion between the injectors and the substrate. In the first step, a first chemical precursor is injected from the first injector; in the second step carrier gas is pulsed to sweep the surface. In the third step, second precursor, preferably a radical is injected on the substrate to affect rapid chemical reaction with the chemisorbed monolayer of the first chemical precursor. Finally in the fourth step, only radicals are injected on the surface to complete the reaction cycle and to sweep the reaction by-products and to prepare the surface. During each gas injection step the substrate rotates at least half the rotation. The reactor can be operated in a pulse precursor and continuous radical flow or constant precursor and constant radical flow modes to modulate processing rate. Operational advantages of such an apparatus and process are lower process temperature, reduction in ion damage and rapid and precision monolayer processing with highly conformal surface coverage over the entire substrate surface.

Claims

1. An apparatus for delivery of reactive chemical precursors to the surface to be treated comprising:

a first precursor source which contains a first precursor selected from a group comprising a molecular chemical reagent and free radicals;

a second precursor source which contains a second precursor selected from a group comprising a molecular chemical reagent and free radicals;

a processing chamber which contains an object holder for holding at least one object with said surface to be treated, said object holder having a circular shape with a diameter;

a precursor delivery and application means connected to said a first precursor source and said second precursor source and comprising at least one pair of linear injectors located in said processing chamber and arranged substantially diametrically above said surface to be treated;

means for rotating said object holder;

said pair of linear injectors comprising a first linear injector for the supply of said first precursor and a second linear injector for the supply of said second precursor, said first linear injector and said second linear injector having a mutual arrangement including being substantially parallel to each other and one inside the other.

2. The apparatus of claim 1, wherein said first linear injector and said second linear injector each has at least one outlet port.

3. The apparatus of claim 2, further comprising a first inlet port for delivering said first precursor to said first linear injector and a second inlet port for delivering said second precursor to said second linear injector, said first linear injector and said second linear injector each having two opposite ends, spaced from each other at a distance substantially equal to said diameter, and an intermediate portion between said ends, said inlet port of each of said first linear injector and of said second linear injector being located in a position selected from the group consisting of any of said ends and said intermediate portion.

4. The apparatus of claim 3, further provided with controlling means for controlling operation of said first precursor source, said second precursor source, and said means for rotating said object holder so that said surface to be treated is processed completely during at least half-rotation of said object holder.

5. The apparatus of claim 3, wherein at least one of said first linear injector and said second linear injector being further provided with fluid distribution means for defining a flow of said fluid to any point of said at least one outlet port across said diameter.

6. The apparatus of claim 4, wherein at least one of said first linear injector and said second linear injector being further provided with fluid distribution means for defining a flow of said fluid to any point of said at least one outlet port across said diameter.

7. The apparatus of claim 5, wherein said fluid distribution means comprise a plurality of vanes extending between said inlet port of said at least one linear injector and said at least one outlet port.

8. The apparatus of claim 6, wherein said fluid distribution means comprise a plurality of vanes extending between said inlet port of said at least one linear injector and said at least one outlet port.

12. The apparatus of claim 8, wherein said object holder has a central area, each said pair of linear injectors comprises a linear injector assembly, said apparatus having at least two said assemblies which are arranged substantially diametrically across said object holder and intersect with each other in said central area at an angle α

equal to 360°

/2n, where n is the number of said linear injector assemblies.

13. The apparatus of claim 12, wherein said pair of linear injectors comprises a first linear injector and a second linear injector which have a mutual arrangement selected from parallel to each other and one inside the other.

14. The apparatus of claim 13, wherein said first linear injector and said second linear injector each has at least one outlet port.

15. The apparatus of claim 14, further comprising a first inlet port for delivering said first precursor to said first linear injector and a second inlet port for delivering said second precursor to said second linear injector, said first linear injector and said second linear injector each having two opposite ends, spaced from each other at a distance substantially equal to said diameter, and an intermediate portion between said ends, said inlet port of each of said first linear injector and of said second linear injector being located in a position selected from the group consisting of any of said ends and said intermediate portion.

16. The apparatus of claim 15, further provided with controlling means for controlling operation of said first precursor source, said second precursor source, and said means for rotating said object holder so that said surface to be treated is processed completely during at least half-rotation of said object holder.

17. The apparatus of claim 15, wherein at least one of said first linear injector and said second linear injector being further provided with fluid distribution means for defining a flow of said fluid to any point of said at least one outlet port across said diameter.

18. The apparatus of claim 16 wherein at least one of said first linear injector and said second linear injector being further provided with fluid distribution means for defining a flow of said fluid to any point of said at least one outlet port across said diameter.

19. The apparatus of claim 17, wherein said fluid distribution means comprise a plurality of vanes extending between said inlet port of said at least one linear injector and said at least one outlet port.

20. The apparatus of claim 18, wherein said fluid distribution means comprise a plurality of vanes extending between said inlet port of said at least one linear injector and said at least one outlet port.

9. An apparatus for delivery of reactive chemical precursors to the surface to be treated comprising:

a first precursor source which contains a first precursor selected from a group comprising a molecular chemical reagent and free radicals;

a second precursor source which contains a second precursor selected from a group comprising a molecular chemical reagent and free radicals;

a processing chamber which contains an substrate holder for holding a substrate with said surface to be treated, said substrate holder having a circular shape with a diameter;

a pair of linear injectors located in said processing chamber and arranged substantially diametrically above said surface to be treated, said pair comprising a first linear injector for the supply of said first precursor and a second linear injector for the supply of said second precursor;

means for rotating said substrate holder;

at least one of said first linear injector and said second linear injector being further provided with fluid distribution means for defining a flow of said fluid to any point of said at least one outlet port across said diameter;

said pair of linear injectors comprising a first linear injector and a second linear injector which have a mutual arrangement including being substantially parallel to each other and one inside the other, each of said first linear injector and a second linear injector having at least one inlet port and outlet means selected from a group comprising a slit arranged substantially along said diameter and a plurality of outlet openings arranged substantially along said diameter.

10. The apparatus of claim 9, wherein said first linear injector and said second linear injector each having two opposite ends, spaced from each other at a distance substantially equal to said diameter, and an intermediate portion between said ends, said at least one inlet port of each of said first linear injector and of said second linear injector being located in a position selected from a group comprising any of said ends and said intermediate portion.

11. The apparatus of claim 10, further comprising controlling means for controlling operation of said first precursor source, said second precursor source, and said means for rotating said object holder so that said surface to be treated is processed completely during at least half-rotation of said object holder.

21. A method for delivery of reactive chemical precursors to the surface of an object to be treated, comprising the steps of:

providing an apparatus comprising;

a source of a non-reactive gas for the supply of a non-reactive gas;

a first precursor source which contains a first precursor selected from a group comprising a molecular chemical reagent and free radicals;

a second precursor source which contains a second precursor selected from a group comprising a molecular chemical reagent and free radicals;

a processing chamber which contains an object holder for holding at least one object with said surface to be treated, said object holder having a circular shape with a diameter;

a precursor delivery and application means connected to said a first precursor source and said second precursor source and comprising at least one pair of linear injectors located in said processing chamber and arranged substantially diametrically above said surface to be treated;

means for rotating said object holder; and

controlling means for controlling operation of said first precursor source, said second precursor source, and said means for rotating said object holder so that said surface to be treated is processed completely during at least a part of rotation of said object holder, said pair of linear injectors comprising a first linear injector for the supply of said first precursor and a second linear injector for the supply of said second precursor, said first linear injector and said second linear injector having mutual arrangement including being substantially parallel to each other and one inside the other;

placing said object onto said object holder inside said processing chamber;

placing said object onto said object holder inside said processing chamber;

evacuating said processing chamber;

supplying said first precursor to the surface of said object through said first linear injector during a first part of rotation, which is equal to said at least a part of rotation, for saturating said surface with said first precursor to form the surface saturated with said first precursor;

supplying said non-reactive gas to the surface of said object through said first linear injector during a second part of rotation, which is the same as said at least part of rotation, for removing an excess of said first precursor from said surface saturated with said first precursor thus forming a chemisorbed monolayer of said first precursor;

supplying said second precursor to said chemisorbed monolayer through said second linear injector during a third part of rotation, which is equal to said at least part of rotation; and

supplying said free radicals to said chemisorbed monolayer through a linear injector selected from said first linear injector and said second linear injector during the fourth part of rotation, which is equal to at least said part of rotation.

22. The method of claim 21, wherein said step of supplying said free radicals to said chemisorbed monolayer is carried out by rotating said substrate holder for more than said at least part of rotation.

23. The method of claim 22, wherein said step of steps of supplying said first precursor and said non-reactive gas are carried out by rotating said substrate holder for more than said at least part of rotation and simultaneously with the supply of said free radicals.