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Method for CVD process control for enhancing device performance

  • US 20040133361A1
  • Filed: 09/16/2003
  • Published: 07/08/2004
  • Est. Priority Date: 12/03/1999
  • Status: Active Grant
First Claim
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1. A method implemented by one or more processors, comprising:

  • receiving first information relating a plurality of flow rates of a species to corresponding concentrations of the species within films generated using the flow rates;

    receiving a desired concentration profile of the species within a desired film; and

    generating a plurality of process steps that, when performed, would form the desired film with the desired concentration profile by controlling the flow rate of the species based, in part, on the first information and the desired concentration profile, wherein a first concentration of the species at a first point in the desired concentration profile differs from a second concentration of the species at a second point in the desired concentration profile.

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