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Processing apparatus including a reactor for electrochemically etching microelectronic workpiece

  • US 20040134774A1
  • Filed: 12/23/2003
  • Published: 07/15/2004
  • Est. Priority Date: 01/03/2000
  • Status: Active Grant
First Claim
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1. A reactor for electrochemically processing a microelectronic workpiece comprising:

  • a movable electrode assembly disposed for movement along a motion path, the motion path including at least a portion thereof over which the electrode assembly is positioned for processing a microelectronic workpiece;

    a cleaning electrode located along the motion path of a movable electrode assembly.

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