In-process correction of stage mirror deformations during a photolithography exposure cycle
First Claim
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1. A microlithography method including:
- interferometrically measuring information about a position of a microlithography stage with respect to each of multiple metrology axes during a photolithographic exposure cycle;
analyzing the position information to determine correction factors indicative of local slope oil a side of the stage used to reflect an interferometric measurement beam and optical gradients caused by environmental effects produced by the photolithographic exposure cycle; and
applying the correction factors to subsequent interferometric measurements of the stage.
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Abstract
A microlithography method includes: interferometrically measuring information about a position of a microlithography stage with respect to each of multiple metrology axes during a photolithographic exposure cycle; analyzing the position information to determine correction factors indicative of a local slope on a side of the stage used to reflect an interferometric measurement beam and optical gradients caused by environmental effects produced by the photolithographic exposure cycle; and applying the correction factors to subsequent interferometric measurements of the stage.
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Citations
14 Claims
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1. A microlithography method including:
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interferometrically measuring information about a position of a microlithography stage with respect to each of multiple metrology axes during a photolithographic exposure cycle;
analyzing the position information to determine correction factors indicative of local slope oil a side of the stage used to reflect an interferometric measurement beam and optical gradients caused by environmental effects produced by the photolithographic exposure cycle; and
applying the correction factors to subsequent interferometric measurements of the stage. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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Specification