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Via/line inductor on semiconductor material

  • US 20040140526A1
  • Filed: 01/09/2004
  • Published: 07/22/2004
  • Est. Priority Date: 12/28/2001
  • Status: Active Grant
First Claim
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1. A method of manufacturing a spiral inductor comprising:

  • providing a substrate;

    forming an inductor dielectric layer over the substrate;

    forming a spiral opening in the inductor dielectric layer;

    forming a spiral inductor in the spiral opening, the spiral inductor including; and

    forming a plurality of parallel spiral vias connected together at center proximate and center distal ends of the spiral inductor.

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