Lithographic apparatus, device manufacturing method, and device manufactured thereby
First Claim
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1. A lithographic projection apparatus comprising:
- a radiation system configured to provide a pulsed beam of radiation;
a programmable patterning structure configured to pattern the pulsed beam according to a desired pattern;
a projection system configured to project the patterned beam onto a target portion of a substrate;
a positioning structure configured to move the substrate relative to the projection system; and
an optical structure configured to move the projected beam relative to the projection system during at least one pulse of the pulsed beam such that the projected beam is substantially stationary relative to the substrate during said at least one pulse.
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Abstract
Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing an optical structure configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.
23 Citations
22 Claims
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1. A lithographic projection apparatus comprising:
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a radiation system configured to provide a pulsed beam of radiation;
a programmable patterning structure configured to pattern the pulsed beam according to a desired pattern;
a projection system configured to project the patterned beam onto a target portion of a substrate;
a positioning structure configured to move the substrate relative to the projection system; and
an optical structure configured to move the projected beam relative to the projection system during at least one pulse of the pulsed beam such that the projected beam is substantially stationary relative to the substrate during said at least one pulse. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A device manufacturing method, said method comprising:
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using a radiation system to provide a pulsed beam of radiation;
using a patterning structure to pattern the pulsed beam according to a desired pattern;
projecting the patterned beam onto a target portion of a layer of radiation-sensitive material that at least partially covers a substrate;
moving the substrate relative to the projection system; and
moving the projected beam relative to the projection system during at least one pulse of the pulsed beam such that the projected beam is substantially stationary relative to the substrate during said at least one pulse. - View Dependent Claims (14)
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15. A lithographic projection apparatus comprising:
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a radiation system configured to provide a pulsed beam of radiation;
a programmable patterning structure configured to pattern the pulsed beam according to a desired pattern;
a projection system configured to project the patterned beam onto a target portion of a substrate;
a positioning structure configured to move the substrate relative to the projection system; and
an optical structure configured to alter a path of the projected beam relative to the projection system during at least one pulse of the pulsed beam such that a cross-section of the projected beam in a plane parallel to a surface of the target portion is substantially stationary relative to the substrate during said at least one pulse. - View Dependent Claims (16, 17, 18, 19)
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20. A device manufacturing method, said method comprising:
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using a radiation system to provide a pulsed beam of radiation;
using a patterning structure to pattern the pulsed beam according to a desired pattern;
projecting the patterned beam onto a target portion of a layer of radiation-sensitive material that at least partially covers a substrate;
moving the substrate relative to the projection system; and
altering a path of the projected beam relative to the projection system during at least one pulse of the pulsed beam such that a cross-section of the projected beam in a plane parallel to a surface of the target portion is substantially stationary relative to the substrate during said at least one pulse. - View Dependent Claims (21, 22)
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Specification