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Method of manufacturing a CMOS image sensor

  • US 20040142568A1
  • Filed: 12/24/2003
  • Published: 07/22/2004
  • Est. Priority Date: 12/30/2002
  • Status: Active Grant
First Claim
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1. A method of manufacturing -microlenses in a CMOS image sensor, comprising:

  • (a) coating a filter layer over a semiconductor substrate with a first photoresist;

    (b) selectively exposing the first photoresist to light;

    (c) coating the first photoresist with a second photoresist;

    (d) selectively exposing the second photoresist to light to define a plurality of micro-lens bodies; and

    (e) heating the plurality of micro-lens bodies to form a plurality of micro-lenses.

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