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Method and apparatus for cleaning a CVD chamber

  • US 20040144490A1
  • Filed: 01/27/2003
  • Published: 07/29/2004
  • Est. Priority Date: 01/27/2003
  • Status: Active Grant
First Claim
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1. A method for plasma cleaning a chamber for processing a substrate, said chamber having a first portion comprising a substrate support pedestal, a second portion coupled to a source of radio-frequency power, and an electrode electrically isolated from the first portion and the second portion, comprising:

  • connecting the electrode to the first portion;

    supplying a cleaning gas into the chamber; and

    applying radio-frequency power from said source to energize the cleaning gas to a plasma within the second portion.

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