Ion sources for ion implantation apparatus
First Claim
1. An ion implantation apparatus including an ionization chamber having a gas inlet port and an outlet through which ions created in the chamber can exit the chamber, the chamber containing an ion source body comprising aluminium oxide, a source of etchant gas selected from the group consisting of fluorine and sulphur hexafluoride under pressure connected to the inlet port of the chamber, and an energy source to ionize etchant gas in the chamber and thereby to form a plasma containing ions of aluminium derived from said ion source body.
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Abstract
The invention relates to an ion source for an ion implanter in which source material for providing desired ions is provided in the form of a plate or liner which can be fitted into the reactant chamber of the ion source.
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Citations
32 Claims
- 1. An ion implantation apparatus including an ionization chamber having a gas inlet port and an outlet through which ions created in the chamber can exit the chamber, the chamber containing an ion source body comprising aluminium oxide, a source of etchant gas selected from the group consisting of fluorine and sulphur hexafluoride under pressure connected to the inlet port of the chamber, and an energy source to ionize etchant gas in the chamber and thereby to form a plasma containing ions of aluminium derived from said ion source body.
- 2. An ion implantation apparatus including an ionization chamber having a gas inlet port and an outlet through which ions created in the chamber can exit the chamber, the chamber containing an ion source body comprising a material selected from the group consisting of aluminium, aluminium nitride, magnesium, magnesium oxide, magnesium nitride, indium, indium oxide, indium nitride, and refractory metals, and compounds thereof, capable of providing ions intended for implantation, a source of etchant gas selected from the group consisting of nitrogen trifluoride, boron trifluoride, fluorine and sulphur hexafluoride under pressure connected to the inlet port of the chamber, and an energy source to ionize etchant gas in the chamber and thereby to form a plasma containing ions of aluminium derived from said ion source body.
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18. An ion implantation apparatus including an ion source comprising
a chamber having a gas inlet port and an outlet, the chamber containing an aluminium ion source body in the form of at least one plate having planar surfaces and a thickness, the plate being porous and formed from pure alumina, a source of an etchant gas selected from the group consisting of fluorine and sulphur hexafluoride under pressure connected to the inlet port of the chamber, an energy source to ionize etchant gas in the chamber and thereby to form a plasma containing ions of aluminium derived from said ion source body; - and
at least one ion extraction electrode associated with the ion source for extracting the aluminium ions from the chamber through said outlet, said ion source body being located within the chamber and in opposed relationship to said at least one ion extraction electrode. - View Dependent Claims (23)
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19. An ion implantation apparatus including an ion source comprising
a chamber having a gas inlet port and an outlet, the chamber containing an ion source body in the form of at least one plate having planar surfaces and a thickness, the plate being porous and formed from a material selected from the group consisting of aluminium nitride, magnesium, indium, and oxides and nitrides thereof, and pure refractory metals, a source of etchant gas selected from the group consisting of nitrogen trifluoride, boron trifluoride, fluorine and sulphur hexafluoride under pressure connected to the inlet port of the chamber, an energy source to ionize etchant gas in the chamber and thereby to form a plasma containing ions derived from said ion source body, and at least one ion extraction electrode associated with the ion source for extracting the ions from the chamber through said outlet, said ion source body being located within the chamber, in opposed relationship to said at least one extraction electrode.
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20. A method of generating aluminium ions for implantation into a substrate mounted in an ion implantation apparatus, the method comprising placing a preformed body of solid alumina as ion source material in an ionization chamber, supplying a gas selected from the group consisting of fluorine and sulphur hexafluoride to the chamber to contact the ion source material, generating a plasma in the ionization chamber to cause dissociation and ionization of the ion source material and the gas, and extracting the resultant aluminium ions from the ionization chamber for implantation.
- 21. A method of generating ions for implantation into a substrate mounted in an ion implantation apparatus, the method comprising placing a preformed body of solid ion source material, selected from the group consisting of aluminium nitride, magnesium, indium and oxides and nitrides thereof, and refractory metals and oxides and nitrides thereof, all capable of providing ions intended for implantation, in an ionization chamber, the ion source material being in the form of a preformed solid which at least partially lines the interior of the chamber, supplying a gas selected from the group consisting of nitrogen trifluoride, boron trifluoride, fluorine and sulphur hexafluoride to the chamber to contact the solid ion source material, generating a plasma in the ionisation chamber to cause dissociation and ionisation of the source material and the gas, and extracting the resultant ions from the ionisation chamber for implantation, the ion source material and the etchant gas being selected such that no additional ions are created having the same or similar charge/mass ratio to that of the selected ions.
- 24. An element for use in an ionisation chamber of an ion implantation apparatus for supplying ions for implantation into a semiconductor substrate, the element being formed of a non-aluminium-containing ion source material selected from the group consisting of refractory metals and oxides and nitrides of elements providing ions intended for implantation and provided in the form of one or more solid plates locatable in said chamber.
- 26. An element for use in an ionisation chamber of an ion implantation apparatus for supplying aluminium ions for implantation into a semiconductor substrate, the element being preformed of an ion source material selected from the group consisting of pure alumina and pure aluminium nitride in the form of a solid and being locatable in said chamber, the source material having a purity of 99.9% or better and containing no or negligible contaminant, the source material having a purity of 99.9% or better and containing no or negligible contaminant.
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32. An element for use in an ionisation chamber of an ion implantation apparatus for supplying aluminium ions for implantation into a semiconductor substrate, the element being formed of a source material selected from the group consisting of pure alumina and pure aluminium nitride in the form of a solid and being locatable in said chamber, the source material having a purity of at least 99.99% and containing no or negligible contaminant, the solid source material being about 50% porous measured against a fully dense body thereof, and the element being in the form of a cuboid plate of dimensions such that it can be located against an inner rectangular wall of said chamber and being so formed as to include at least surface irregularities such as to provide for stress relief when the body is subjected to operational temperatures and to maximise the surface area of the plate.
Specification