Liquid crystal display device and method of manufacturing the same

• US 20040145687A1
• Filed: 01/15/2004
• Published: 07/29/2004
• Est. Priority Date: 11/15/1999
• Status: Active Grant

• Current Assignee: LG Display Co., Ltd.
• Original Assignee: LG Philips LCD Company Limited (LG Display Co., Ltd.)
• Inventors: Kim, Woong-Kwon
• Granted Patent: US 7,193,668 B2
• Time in Patent Office: Days
• US Class Current: 349/43
• CPC Class Codes: G02F 1/133514 Colour filters
• CPC Class Codes: G02F 1/1362 Active matrix addressed cells G02F1/134336, G02F1/134363 take precedence
• CPC Class Codes: G02F 1/136222 Colour filters incorporated in the active matrix substrate

Abstract

A liquid crystal display (LCD) device having a color filter on a thin film transistor (TFT) structure (COT structure). The color filter layers are formed on the same substrate as the TFT to be in direct contact with the source and drain electrodes without any intermediaries therebetween. In particular, there is no need for a passivation layer between the TFT and the color filter layers. Preferred embodiments include a back etched type TFT that does not require a light shielding layer, an etch-stopped type TFT having an etch stop layer, and a coplanar type TFT having a light shielding layer below the gate electrode of the TFT.

Claims

1. A liquid crystal display (LCD) device, comprising:

a thin film transistor (TFT) formed on a substrate, the TFT having a gate, a source and a drain;

a color filter layer formed on the TFT to be in direct contact with at least the source or the drain; and

a pixel electrode formed above the color filter layer to be in electrical contact with the drain.

2. The device of claim 1, wherein the color filter layer and at least the source or the drain are in direct contact such that there are no intermediaries therebetween.

3. A method of manufacturing a liquid crystal display (LCD) device, comprising:

forming a thin film transistor (TFT) on a substrate, the TFT having a gate, a source and a drain;

forming a color filter layer on the TFT to be in direct electrical contact with at least the source or the drain; and

forming a pixel electrode above the color filter layer to be in electrical contact with the drain.

4. The method according to claim 3, wherein LCD is manufactured without forming a passivation layer between the TFT and the color filter layer.