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Method of manufacturing microneedle structures using soft lithography and photolithography

  • US 20040146611A1
  • Filed: 12/03/2003
  • Published: 07/29/2004
  • Est. Priority Date: 03/14/2001
  • Status: Active Grant
First Claim
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1. A method for fabricating microneedles, said method comprising:

  • (a) providing a substrate material;

    (b) coating said substrate material with at least one layer of a photoresist material, and patterning said photoresist material with a plurality of microstructures by use of a photolithography procedure; and

    (c) separating said patterned photoresist material from said substrate material, thereby creating a microneedle structure from said patterned photoresist material containing said plurality of microstructures.

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