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Method for manufacturing resist pattern and method for manufacturing semiconductor device

  • US 20040147066A1
  • Filed: 01/14/2004
  • Published: 07/29/2004
  • Est. Priority Date: 01/17/2003
  • Status: Active Grant
First Claim
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1. A method for manufacturing a resist pattern, comprising the step of forming the resist pattern by discharging a composition containing a photosensitizer on an object to be processed under reduced pressure.

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