Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials

• US 20040147421A1
• Filed: 10/22/2003
• Published: 07/29/2004
• Est. Priority Date: 12/04/2001
• Status: Active Grant

• Current Assignee: EKC Technology, Inc (DuPont de Nemours, Inc.)
• Original Assignee: EKC Technology, Inc (DuPont de Nemours, Inc.)
• Inventors: Zhou, De-Ling, Small, Robert J., Lee, Shihying, Charm, Richard William
• Granted Patent: US 7,135,445 B2
• Time in Patent Office: Days
• US Class Current: 510/176
• CPC Class Codes: C11D 2111/22 Electronic devices, e.g. PCBs or semiconductors
• CPC Class Codes: C11D 7/3218 Alkanolamines or alkanolimines
• CPC Class Codes: C11D 7/3281 Heterocyclic compounds
• CPC Class Codes: C11D 7/34 containing sulfur
• CPC Class Codes: G03F 7/425 containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
• CPC Class Codes: G03F 7/426 containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Abstract

A new cleaning chemistry based on bis-choline and tris-choline compounds, such as their hydroxides, is provided in order to address the removal of photoresist and flux while minimizing any etching of the substrate.

Claims

1. A cleaning or photoresist stripping composition comprising:

(a) from about 5% to about 50% by weight of a polar aprotic nitrogen-containing solvent having a dipole moment of more than about 3.5;

(b) from about 0.2% to about 20% by weight of a choline derivative selected from the group consisting of a bis-choline salt, a tris-choline salt, and a mixture thereof; and

(c) from about 50% to about 94% by weight of a sulfur-containing solvent selected from the group consisting of a sulfoxide, a sulfone, and a mixture thereof.

2. The composition of claim 1, wherein the polar aprotic nitrogen-containing solvent comprises N-methyl-2-pyrrolidone.

3. The composition of claim 1, wherein the polar aprotic nitrogen-containing solvent is present in an amount from about 15% to about 35% by weight,

4. The composition of claim 3, wherein the polar aprotic nitrogen-containing solvent is present in an amount from about 20% to about 30% by weight.

5. The composition of claim 4, wherein the polar aprotic nitrogen-containing solvent is present in an amount from about 24% to about 26% by weight.

6. The composition of claim 1, wherein the choline derivative is present in an amount from about 0.5% to about 10% by weight.

7. The composition of claim 6, wherein the choline derivative is present in an amount from about 1% to about 5% by weight.

8. The composition of claim 7, wherein the choline derivative is present in an amount from about 1% to about 3% by weight.

9. The composition of claim 1, wherein the sulfur-containing solvent comprises dimethyl sulfoxide, methyl sulfoxide, or a mixture thereof.

10. The composition of claim 9, wherein the sulfur-containing solvent is present in an amount from about 60% to about 84% by weight.

11. The composition of claim 10, wherein the sulfur-containing solvent is present in an amount from about 66% to about 76% by weight.

12. The composition of claim 11, wherein the sulfur-containing solvent is present in an amount from about 70% to about 72% by weight.

13. The composition of claim 1, which is further substantially free of water.

14. The composition of claim 1, which is further substantially free of one or more of the following:

additional amines, additional corrosion inhibitors, additional chelating agents, additional surfactants, additional organic solvents, additional acids, and additional bases.

15. The composition of claim 14, which is further substantially free of all of the following:

additional amines, additional corrosion inhibitors, additional chelating agents, additional surfactants, additional organic solvents, additional acids, and additional bases.

16. The composition of claim 1, further comprising up to about 10% by weight of water.

17. A cleaning or photoresist stripping composition consisting essentially of:

(a) from about 5% to about 50% by weight of a polar aprotic nitrogen-containing solvent having a dipole moment of more than about 3.5;

(b) from about 0.2% to about 20% by weight of a choline derivative selected from the group consisting of a bis-choline salt, a tris-choline salt, and a mixture thereof; and

(c) from about 50% to about 94% by weight of a sulfur-containing solvent selected from the group consisting of a sulfoxide, a sulfone, and a mixture thereof.

18. The composition of claim 17, wherein the polar aprotic nitrogen-containing solvent comprises N-methyl-2-pyrrolidone.

19. The composition of claim 17, wherein the polar aprotic nitrogen-containing solvent is present in an amount from about 15% to about 35% by weight.

20. The composition of claim 19, wherein the polar aprotic nitrogen-containing solvent is present in an amount from about 20% to about 30% by weight.

21. The composition of claim 17, wherein the choline derivative is present in an amount from about 0.5% to about 10% by weight.

22. The composition of claim 21, wherein the choline derivative is present in an amount from about 1% to about 5% by weight.

23. The composition of claim 17, wherein the sulfur-containing solvent comprises dimethyl sulfoxide, methyl sulfoxide, or a mixture thereof.

24. The composition of claim 23, wherein the sulfur-containing solvent is present in an amount from about 60% to about 84% by weight.

25. The composition of claim 24, wherein the sulfur-containing solvent is present in an amount from about 66% to about 76% by weight.