Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials
First Claim
Patent Images
1. A cleaning or photoresist stripping composition comprising:
- (a) from about 5% to about 50% by weight of a polar aprotic nitrogen-containing solvent having a dipole moment of more than about 3.5;
(b) from about 0.2% to about 20% by weight of a choline derivative selected from the group consisting of a bis-choline salt, a tris-choline salt, and a mixture thereof; and
(c) from about 50% to about 94% by weight of a sulfur-containing solvent selected from the group consisting of a sulfoxide, a sulfone, and a mixture thereof.
1 Assignment
0 Petitions
Accused Products
Abstract
A new cleaning chemistry based on bis-choline and tris-choline compounds, such as their hydroxides, is provided in order to address the removal of photoresist and flux while minimizing any etching of the substrate.
-
Citations
25 Claims
-
1. A cleaning or photoresist stripping composition comprising:
-
(a) from about 5% to about 50% by weight of a polar aprotic nitrogen-containing solvent having a dipole moment of more than about 3.5;
(b) from about 0.2% to about 20% by weight of a choline derivative selected from the group consisting of a bis-choline salt, a tris-choline salt, and a mixture thereof; and
(c) from about 50% to about 94% by weight of a sulfur-containing solvent selected from the group consisting of a sulfoxide, a sulfone, and a mixture thereof. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
-
-
17. A cleaning or photoresist stripping composition consisting essentially of:
-
(a) from about 5% to about 50% by weight of a polar aprotic nitrogen-containing solvent having a dipole moment of more than about 3.5;
(b) from about 0.2% to about 20% by weight of a choline derivative selected from the group consisting of a bis-choline salt, a tris-choline salt, and a mixture thereof; and
(c) from about 50% to about 94% by weight of a sulfur-containing solvent selected from the group consisting of a sulfoxide, a sulfone, and a mixture thereof. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25)
-
Specification