Inductively coupled plasma downstream strip module
First Claim
1. A plasma processing module for processing a substrate, the plasma processing module comprising:
- a) a plasma containment chamber including a feed gas inlet port capable of allowing a feed gas to enter the plasma containment chamber of the plasma processing module during the processing of the substrate;
b) an inductively coupled source capable of energizing the feed gas and striking a plasma within the plasma containment chamber, the specific configuration of the inductively coupled source causing the plasma to be formed such that the plasma includes a primary dissociation zone within the plasma containment chamber;
c) a secondary chamber separated from the plasma containment chamber by a plasma containment plate, the secondary chamber including a chuck and an exhaust port, the chuck being configured to support the substrate during the processing of the substrate and the exhaust port being connected to the secondary chamber such that the exhaust port allows gases to be removed from the secondary chamber during the processing of the substrate; and
d) a chamber interconnecting port that interconnects the plasma containment chamber and the secondary chamber, the chamber interconnecting port allowing gases from the plasma containment chamber to flow into the secondary chamber during the processing of the substrate, the chamber interconnecting port being positioned between the plasma containment chamber and the secondary chamber such that, when the substrate is positioned on the chuck in the secondary chamber, there is no substantial direct line-of-sight exposure of the substrate to the primary dissociation zone of the plasma formed within the plasma containment chamber.
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Abstract
A plasma processing module for processing a substrate includes a plasma containment chamber having a feed gas inlet port capable of allowing a feed gas to enter the plasma containment chamber of the plasma processing module during the processing of the substrate. An inductively coupled source is used to energize the feed gas and striking a plasma within the plasma containment chamber. The specific configuration of the inductively coupled source causes the plasma to be formed such that the plasma includes a primary dissociation zone within the plasma containment chamber. A secondary chamber is separated from the plasma containment chamber by a plasma containment plate. The secondary chamber includes a chuck and an exhaust port. The chuck is configured to support the substrate during the processing of the substrate and the exhaust port is connected to the secondary chamber such that the exhaust port allows gases to be removed from the secondary chamber during the processing of the substrate. A chamber interconnecting port interconnects the plasma containment chamber and the secondary chamber. The chamber interconnecting port allows gases from the plasma containment chamber to flow into the secondary chamber during the processing of the substrate. The chamber interconnecting port is positioned between the plasma containment chamber and the secondary chamber such that, when the substrate is positioned on the chuck in the secondary chamber, there is no substantial direct line-of-sight exposure of the substrate to the primary dissociation zone of the plasma formed within the plasma containment chamber.
138 Citations
25 Claims
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1. A plasma processing module for processing a substrate, the plasma processing module comprising:
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a) a plasma containment chamber including a feed gas inlet port capable of allowing a feed gas to enter the plasma containment chamber of the plasma processing module during the processing of the substrate;
b) an inductively coupled source capable of energizing the feed gas and striking a plasma within the plasma containment chamber, the specific configuration of the inductively coupled source causing the plasma to be formed such that the plasma includes a primary dissociation zone within the plasma containment chamber;
c) a secondary chamber separated from the plasma containment chamber by a plasma containment plate, the secondary chamber including a chuck and an exhaust port, the chuck being configured to support the substrate during the processing of the substrate and the exhaust port being connected to the secondary chamber such that the exhaust port allows gases to be removed from the secondary chamber during the processing of the substrate; and
d) a chamber interconnecting port that interconnects the plasma containment chamber and the secondary chamber, the chamber interconnecting port allowing gases from the plasma containment chamber to flow into the secondary chamber during the processing of the substrate, the chamber interconnecting port being positioned between the plasma containment chamber and the secondary chamber such that, when the substrate is positioned on the chuck in the secondary chamber, there is no substantial direct line-of-sight exposure of the substrate to the primary dissociation zone of the plasma formed within the plasma containment chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method of processing a substrate within a plasma processing module, the method comprising the steps of:
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a) providing a plasma processing module including i) a plasma containment chamber having a feed gas inlet port capable of allowing a feed gas to enter the plasma containment chamber of the plasma processing module during the processing of the substrate, ii) a secondary chamber, iii) a plasma containment plate separating the plasma containment chamber from the secondary chamber, and iv) a chamber interconnecting port that interconnects the plasma containment chamber and the secondary chamber allowing gases from the plasma containment chamber to flow into the secondary chamber during the processing of the substrate;
b) placing a substrate within the secondary chamber, the secondary chamber including a chuck and an exhaust port, the chuck being configured to support the substrate during the processing of the substrate and the exhaust port being connected to the secondary chamber such that the exhaust port allows gases to be removed from the secondary chamber during the processing of the substrate;
c) causing a feed gas to be fed into the plasma containment chamber through the feed gas inlet port;
d) using an inductively coupled source to energize the feed gas within the plasma containment chamber and strike a plasma within the plasma containment chamber, the specific configuration of the inductively coupled source causing the plasma to be formed such that the plasma includes a primary dissociation zone within the plasma containment chamber; and
e) exhausting gases from the secondary chamber through the exhaust port such that the feed gas is drawn from the plasma containment chamber through the chamber interconnecting port into the secondary chamber and out of the plasma processing module through the exhaust port, the chamber interconnecting port being positioned between the plasma containment chamber and the secondary chamber such that, when the substrate is positioned on the chuck in the secondary chamber, there is no substantial direct line-of-sight exposure of the substrate to the primary dissociation zone of the plasma formed within the plasma containment chamber. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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Specification