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Plasma processing apparatus

  • US 20040149741A1
  • Filed: 12/17/2003
  • Published: 08/05/2004
  • Est. Priority Date: 12/17/2002
  • Status: Active Grant
First Claim
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1. A plasma processing apparatus, comprising:

  • a plasma processing chamber for processing therein an object to be processed;

    antenna means for guiding microwaves into the plasma processing chamber; and

    a dielectric member disposed between the antenna means and the plasma processing chamber;

    wherein a surface of the dielectric member facing the inside of the plasma processing chamber has a projecting shape.

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