Method of plasma enhanced chemical vapor deposition of diamond using methanol-based solutions
First Claim
1. A method of forming diamond comprising:
- providing a substrate in a reaction chamber in a non-magnetic-field microwave plasma system;
introducing, in the absence of a gas stream, a liquid precursor substantially free of water and containing methanol and at least one carbon and oxygen containing compound having a carbon to oxygen ratio greater than one, into an inlet of the reaction chamber;
vaporizing the liquid precursor; and
subjecting the vaporized precursor, in the absence of a carrier gas and in the absence in a reactive gas, to a plasma under conditions effective to disassociate the vaporized precursor and promote diamond growth on the substrate in a pressure range from about 70 to 130 Torr.
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Accused Products
Abstract
Briefly described, methods of forming diamond are described. A representative method, among others, includes: providing a substrate in a reaction chamber in a non-magnetic-field microwave plasma system; introducing, in the absence of a gas stream, a liquid precursor substantially free of water and containing methanol and at least one carbon and oxygen containing compound having a carbon to oxygen ratio greater than one, into an inlet of the reaction chamber; vaporizing the liquid precursor; and subjecting the vaporized precursor, in the absence of a carrier gas and in the absence in a reactive gas, to a plasma under conditions effective to disassociate the vaporized precursor and promote diamond growth on the substrate in a pressure range from about 70 to 130 Torr.
9 Citations
24 Claims
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1. A method of forming diamond comprising:
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providing a substrate in a reaction chamber in a non-magnetic-field microwave plasma system;
introducing, in the absence of a gas stream, a liquid precursor substantially free of water and containing methanol and at least one carbon and oxygen containing compound having a carbon to oxygen ratio greater than one, into an inlet of the reaction chamber;
vaporizing the liquid precursor; and
subjecting the vaporized precursor, in the absence of a carrier gas and in the absence in a reactive gas, to a plasma under conditions effective to disassociate the vaporized precursor and promote diamond growth on the substrate in a pressure range from about 70 to 130 Torr. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of forming diamond comprising:
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providing a substrate in a reaction chamber in a non-magnetic-field microwave plasma system, the reaction chamber being in fluidic communication with a container through a metering valve, wherein the container includes a liquid precursor substantially free of water containing methanol and at least one carbon and oxygen containing compound having a carbon to oxygen ratio greater than one;
flowing the liquid precursor into the reaction chamber using the metering valve, in the absence of a gas stream flowing through the metering valve entraining the liquid precursor, wherein the liquid precursor vaporizes during entry into the reaction chamber;
vaporizing the liquid precursor;
subjecting the vaporized precursor to a plasma under conditions effective to disassociate the vaporized precursor in the absence of a carrier gas and in the absence in a reactive gas; and
promoting diamond growth on the substrate at a pressure in the range from about 10 to 130 Torr. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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Specification