Lithographic apparatus and device manufacturing method
First Claim
Patent Images
1. A lithographic apparatus comprising:
- an illuminator;
a substrate table disposed in a path of a radiation beam from said illuminator;
a patterning device support disposed to hold a patterning device in the path of the radiation beam between said illuminator and said substrate table;
a projection system disposed in a path of the radiation beam between said patterning device support and said substrate table;
a base frame;
a balance mass supported by and moveable relative to said base frame and coupled to at least one of said substrate table and said patterning device support; and
at least one supporting member attached to said balance mass and to said base frame, wherein said at least one supporting member has a stiff portion and at least two pivot points.
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Accused Products
Abstract
A lithographic projection apparatus in which a balance mass is supported by a base frame using at least one supporting member which is coupled to both the base frame and balance mass. Free horizontal movement is provided by providing the supporting member with at least two pivot points.
25 Citations
31 Claims
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1. A lithographic apparatus comprising:
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an illuminator;
a substrate table disposed in a path of a radiation beam from said illuminator;
a patterning device support disposed to hold a patterning device in the path of the radiation beam between said illuminator and said substrate table;
a projection system disposed in a path of the radiation beam between said patterning device support and said substrate table;
a base frame;
a balance mass supported by and moveable relative to said base frame and coupled to at least one of said substrate table and said patterning device support; and
at least one supporting member attached to said balance mass and to said base frame, wherein said at least one supporting member has a stiff portion and at least two pivot points. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
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24. A lithographic apparatus comprising:
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an illuminator;
a substrate table disposed in a path of a radiation beam from said illuminator;
a patterning device support disposed to hold a patterning device in the path of the radiation beam between said illuminator and said substrate table;
a projection system disposed in a path of the radiation beam between said patterning device support and said substrate table;
a base frame;
a balance mass supported by and moveable relative to said base frame and coupled to at least one of said substrate table and said patterning device support; and
at least one supporting member attached to said balance mass and to said base frame, wherein across an entire cross-section of said at least one supporting portion, said at least one supporting portion is disposed to be under tension in a direction parallel to a principal axis of the at least one supporting portion, the cross-section being in a plane perpendicular to the principal axis. - View Dependent Claims (25, 26)
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27. A device manufacturing method comprising:
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providing a substrate that is at least partially covered by a layer of radiation-sensitive material on a substrate table positioned on a base frame;
projecting a patterned beam of radiation onto the layer of radiation-sensitive material;
moving said substrate table relative to said base frame by generating a force between said substrate table and a balance mass; and
supporting said balance mass using at least one supporting member coupled between said balance mass and said base frame, wherein said at least one supporting member has a stiff portion and at least two pivot points. - View Dependent Claims (28, 29, 30, 31)
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Specification