Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic projection apparatus comprising:
- a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate; and
a liquid supply system configured to at least partly fill a space between said projection system and said substrate, with a liquid through which said beam is to be projected, said liquid supply system comprising;
a liquid confinement structure extending along at least a part of the boundary of said space, and a seal between said structure and the surface of said substrate.
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Abstract
In an immersion lithography apparatus, a member surrounds a space between a projection system and a substrate table. A seal is formed to contain liquid in the space.
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Citations
47 Claims
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1. A lithographic projection apparatus comprising:
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a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate; and
a liquid supply system configured to at least partly fill a space between said projection system and said substrate, with a liquid through which said beam is to be projected, said liquid supply system comprising;
a liquid confinement structure extending along at least a part of the boundary of said space, and a seal between said structure and the surface of said substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. An immersion lithographic projection apparatus, comprising:
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a support structure configured to hold a patterning device, the patterning device configured to pattern a beam according to a desired pattern;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate; and
a liquid confinement structure extending along at least part of the boundary of a space bounded by the periphery of a localized area on the surface of said substrate and said surface of said substrate, said space configured to contain a liquid through which said beam is projected and said structure substantially sealing at least part of said space. - View Dependent Claims (17, 18, 19, 20)
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21. A device manufacturing method comprising:
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providing a liquid to fill a space between a substrate and a projection system, a liquid confinement structure extending along at least a part of the boundary of said space;
forming a gas seal between said structure and the surface of said substrate; and
projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28, 29, 30)
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31. An immersion lithographic projection apparatus comprising:
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a support structure configured to hold a patterning device and movable in a scanning direction, the patterning device configured to pattern a beam of radiation according to a desired pattern;
a substrate table configured to hold a substrate and movable in a scanning direction;
a projection system configured to project the patterned beam onto a target portion of the substrate using a scanning exposure;
a liquid confinement structure that substantially seals at least part of a space bounded by a surface of said substrate and the boundary of a portion of said surface; and
a liquid inlet to provide a liquid, through which said beam is projected, to said space. - View Dependent Claims (32, 33, 34, 35)
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36. A lithographic projection apparatus comprising:
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a support structure configured to hold a patterning device and movable in a scanning direction, the patterning device configured to pattern a beam of radiation according to a desired pattern;
a substrate table configured to hold a substrate and movable in a scanning direction;
a projection system configured to project the patterned beam onto a target portion of the substrate using a scanning exposure;
a liquid confinement structure having an aperture having a cross-sectional area smaller than a surface area of said substrate;
a seal between said structure and said substrate; and
a liquid inlet to provide a liquid, through which said beam is projected, to said aperture. - View Dependent Claims (37, 38, 39, 40)
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41. An immersion lithographic projection apparatus comprising:
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a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate;
a liquid confinement structure that can substantially confine all of a liquid provided to an area of a radiation-sensitive surface of said substrate under said projection system, said area being smaller than the entire area of said substrate surface; and
a liquid inlet to provide a liquid to said area and between said projection system and said substrate surface. - View Dependent Claims (42, 43, 44, 45, 46, 47)
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Specification