Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic projection apparatus comprising:
- a support structure constructed to support a patterning structure, said patterning structure adapted to pattern a beam of radiation according to a desired pattern;
a substrate holder constructed to hold a substrate;
a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;
a downstream radical source, connected to a gas supply, configured to provide a beam of radicals directed onto a surface to be cleaned.
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Abstract
A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.
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Citations
20 Claims
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1. A lithographic projection apparatus comprising:
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a support structure constructed to support a patterning structure, said patterning structure adapted to pattern a beam of radiation according to a desired pattern;
a substrate holder constructed to hold a substrate;
a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;
a downstream radical source, connected to a gas supply, configured to provide a beam of radicals directed onto a surface to be cleaned. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A device manufacturing method comprising:
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providing a beam of radiation;
patterning the beam of radiation;
projecting the patterned beam of radiation onto a target portion of a layer of radiation-sensitive material;
providing a flow of gas in a downstream radical source to produce a beam of radicals; and
directing said beam of radicals onto a surface to be cleaned.
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15. A lithographic projection apparatus comprising:
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a radiation source that provides a beam of radiation;
a support structure constructed to support a patterning structure, said patterning structure adapted to pattern the beam of radiation according to a desired pattern;
a substrate holder constructed to hold a substrate;
a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;
a radical source connected to a gas supply and configured to provide a localized beam of radicals; and
a structure to direct said beam of radicals onto a surface to be cleaned, wherein said radical source is disposed away from said radiation source such that operating conditions of said radical source do not adversely affect said beam of radiation. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification