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Plasma processing equipment and plasma processing method

  • US 20040168769A1
  • Filed: 01/09/2004
  • Published: 09/02/2004
  • Est. Priority Date: 05/10/2002
  • Status: Abandoned Application
First Claim
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1. A plasma processing apparatus, comprising:

  • at least, a processing chamber for plasma-processing an object to be processed;

    gas supply means for supplying a gas into the processing chamber; and

    high-frequency supplying means for forming the gas into a plasma state;

    wherein the gas supply means has at least one gas introduction pipe, the tip of the gas introduction pipe is placed in a position so that the tip is projected from the inner wall of the processing chamber facing the object to be processed, toward the interior of the processing chamber.

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