Thin film forming device, method of forming a thin film, and self-light-emitting device

• US 20040171182A1
• Filed: 03/02/2004
• Published: 09/02/2004
• Est. Priority Date: 03/06/2000
• Status: Active Grant

• Current Assignee: Masaaki Hiroki, Noriko Ishimaru, Shunpei Yamazaki
• Original Assignee: Masaaki Hiroki, Noriko Ishimaru, Shunpei Yamazaki
• Inventors: Hiroki, Masaaki, Yamazaki, Shunpei, Ishimaru, Noriko
• Granted Patent: US 7,022,535 B2
• Time in Patent Office: Days
• US Class Current: 438/22
• CPC Class Codes: C23C 14/042 using masks
• CPC Class Codes: H10K 59/00 Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
• CPC Class Codes: H10K 59/12 Active-matrix OLED [AMOLED] displays
• CPC Class Codes: H10K 59/17 Passive-matrix OLED displays
• CPC Class Codes: H10K 59/35 comprising red-green-blue [RGB] subpixels
• CPC Class Codes: H10K 71/00 Manufacture or treatment specially adapted for the organic devices covered by this subclass
• CPC Class Codes: H10K 71/164 using vacuum deposition
• CPC Class Codes: H10K 71/166 using selective deposition, e.g. using a mask
• CPC Class Codes: H10K 85/30 Coordination compounds
• CPC Class Codes: H10K 85/311 Phthalocyanine
• CPC Class Codes: H10K 85/342 comprising iridium
• CPC Class Codes: H10K 85/346 comprising platinum
• CPC Class Codes: H10K 85/653 comprising only oxygen as heteroatom
• CPC Class Codes: Y10S 438/942 Masking

Abstract

Measure of forming an EL layer by selectively depositing through evaporation a material for forming the EL layer at a desired location is provided. When a material for forming an EL layer is deposited, a mask (113) is provided between a sample boat (111) and a substrate (110). By applying voltage to the mask (113), the direction of progress of the material for forming the EL layer is controlled to be selectively deposited at a desired location.

Claims

1. A method of forming a thin film,

wherein a sample boat having an EL material contained therein, a substrate having an electrode provided thereon, and a mask between the sample boat and the substrate are provided,

wherein the EL material is made to be in a vapor state in the sample boat,

wherein the EL material is in the vapor state is discharged from the sample boat toward the substrate, and

wherein the EL material in the vapor state is made to pass through an opening of the mask corresponding to the electrode to deposit the EL material on the electrode on the substrate and form a thin film.

2. A method of forming a thin film as claimed in claim 1, wherein voltage is applied to the mask.

3. A method of forming a thin film as claimed in claim 1, wherein the EL material in a vapor state is charged when the EL material is made to be in a vapor state in the sample boat and the EL material in a vapor state is discharged from the sample boat toward the substrate.

4. A method of forming a thin film as claimed in claims 1, wherein the opening in the mask is a gap of blocking portions.

5. A method of forming a thin film as claimed in claim 1, wherein there are a plurality of the masks and different voltages are applied to the respective plurality of masks.

6. A method of forming a thin film as claimed in claim 1, wherein the electrode is a pixel electrode.

7. A method of forming a thin film as claimed in claim 1, wherein the EL material is a low molecular weight material.

8. A method of forming a thin film as claimed in claim 1, wherein the thickness of the thin film is 10 nm to 10 μ

m.

9. A method of forming a thin film as claimed in claim 1, wherein the mask is a conductive wire formed of a conductive material, a mesh-like structure formed of conductive wires, a plate-like structure formed of a conductive material, or a plurality of conductive wires arranged in parallel with one another.

10. A self-light-emitting device manufactured using a method of forming a thin film as claimed in claim 1.

11. A thin film forming device comprising:

a sample boat having an EL material contained therein;

means for making the EL material in a vapor state in the sample boat;

a substrate having an electrode provided thereon;

a mask between the sample boat and the substrate; and

means for applying voltage to the mask.

12. A thin film forming device as claimed in claim 11, wherein a direction of progress or a location of deposition of the EL material in the vapor state is controlled by the means for applying voltage to the mask.

13. A thin film forming device as claimed in claim 11, further comprising means for charging the EL material in the vapor state.

14. A thin film forming device as claimed in claim 11, by further comprising another mask provided between the substrate and the mask, and voltage which is different from that applied to the mask is applied to the another mask.

15. A method of forming a thin film,

wherein a sample boat having an EL material contained therein, a substrate having an electrode provided thereon, and a mask between the sample boat and the substrate are provided,

wherein the EL material is made to be in a vapor state in the sample boat,

wherein the EL material is in the vapor state is discharged from the sample boat toward the substrate,

wherein the EL material in the vapor state is made to pass through an opening of the mask corresponding to the electrode to deposit the EL material on the electrode on the substrate and form a thin film, and

wherein voltage is applied to the mask.

16. A method of forming a thin film,

wherein a sample boat having an EL material contained therein, a substrate having an electrode provided thereon, and a mask between the sample boat and the substrate are provided,

wherein the EL material is made to be in a vapor state in the sample boat,

wherein the EL material is in the vapor state is discharged from the sample boat toward the substrate,

wherein the EL material in the vapor state is made to pass through an opening of the mask corresponding to the electrode to deposit the EL material on the electrode on the substrate and form a thin film, and

wherein the EL material in the vapor state is charged.

17. A thin film forming device comprising:

a sample boat having an EL material contained therein;

means for making the EL material in a vapor state in the sample boat;

a substrate having an electrode provided thereon;

a mask between the sample boat and the substrate;

means for applying voltage to the mask; and

means for charging the EL material in the vapor state.