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Semiconductor fabricating apparatus with function of determining etching processing state

  • US 20040174530A1
  • Filed: 03/04/2003
  • Published: 09/09/2004
  • Est. Priority Date: 03/04/2003
  • Status: Active Grant
First Claim
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1. A semiconductor fabricating apparatus etching a semiconductor wafer, placed in a chamber and having films thereon, using plasma generated in the chamber, said semiconductor fabricating apparatus comprising:

  • a detector that detects a change in an amount of light with at least two wavelengths obtained from a surface of the wafer for a predetermined time during the processing; and

    a determination unit that compares an interval between a time at which an amount of light with one of the two wavelengths is maximized and a time at which an amount of light with the other wavelength is minimized with a predetermined value to determine a state of the etching.

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