Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes
First Claim
1. An inductively-coupled plasma reactor comprising:
- reactor chamber adapted to retain a plasma;
a power source; and
plural inductive antenna coils connected in parallel between said power source and ground and disposed at least partially around said chamber.
3 Assignments
0 Petitions
Accused Products
Abstract
An antenna adapted to apply uniform electromagnetic fields to a volume of gas and including radiating elements connected in parallel with evenly distributed input terminals for receiving electromagnetic energy into the antenna and output terminals for grounding. In the illustrative embodiment, the antenna has three radiating elements connected in parallel. Each radiating element is a conductor wound in a circular shape with the same diameter. Each radiating element is connected to the input terminal on one end and an output terminal on the other. The input terminal of the second element is 120° rotated counterclockwise from the first and the input terminal of the third is rotated by 120° counterclockwise from the second. The ground terminals of each radiating elements are located in the same manner as the input terminals. The inventive antenna affords a novel method for plasma processing a device including the steps of mounting the device within a chamber; and applying an electromagnetic field to the gas via an array of antenna elements disposed relative to the gas to generate a uniform distribution of the plasmas.
18 Citations
20 Claims
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1. An inductively-coupled plasma reactor comprising:
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reactor chamber adapted to retain a plasma;
a power source; and
plural inductive antenna coils connected in parallel between said power source and ground and disposed at least partially around said chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An inductively-coupled plasma reactor comprising:
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reactor chamber adapted to retain a plasma;
an RF power source; and
plural inductive antenna coils connected in parallel between said power source and ground and disposed at least partially around said chamber, each of said coils having a single turn or less and being disposed relative to each other to effect and even distribution of energy from said source. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19)
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20. A novel method for plasma processing a device including the steps of:
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mounting the device within a chamber and applying an electromagnetic field to the gas via an array of antenna elements disposed relative to the gas to generate a uniform distribution of the plasma.
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Specification