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Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor

  • US 20040182516A1
  • Filed: 02/13/2004
  • Published: 09/23/2004
  • Est. Priority Date: 02/14/2003
  • Status: Active Grant
First Claim
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1. A magnetic field generator in a semiconductor substrate processing system comprising:

  • a plurality of overlapping main magnetic coils for forming a magnetic field generally parallel to a top surface of a substrate support.

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