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Substrate support having temperature controlled substrate support surface

  • US 20040187787A1
  • Filed: 03/31/2003
  • Published: 09/30/2004
  • Est. Priority Date: 03/31/2003
  • Status: Abandoned Application
First Claim
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1. A substrate support useful in a plasma processing apparatus, comprising:

  • a body having a support surface for supporting a substrate in a reaction chamber of a plasma processing apparatus;

    a first liquid flow passage extending through a first portion of the body so as to provide temperature control of a first portion of the support surface;

    a second liquid flow passage extending through a second portion of the body so as to provide temperature control of a second portion of the support surface;

    a first inlet in fluid communication with the first liquid flow passage;

    a second inlet in fluid communication with the second liquid flow passage;

    a first outlet in fluid communication with the first liquid flow passage; and

    a second outlet in fluid communication with the second liquid flow passage.

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