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Substrate processing method and apparatus

  • US 20040187896A1
  • Filed: 03/30/2004
  • Published: 09/30/2004
  • Est. Priority Date: 03/31/2003
  • Status: Active Grant
First Claim
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1. A substrate processing method comprising the steps of:

  • (i) supplying a chemical liquid on a rotating substrate to form a film of the chemical liquid on a surface of the substrate;

    (ii) supplying a rinse liquid on the rotating substrate to form a film of a mixture of the chemical liquid and the rinse liquid on the surface of the substrate entirely; and

    (iii) removing the mixture from the surface of the substrate by the rinse liquid.

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