Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method
First Claim
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1. A lithographic apparatus comprising:
- a projection system configured to project a patterned beam of radiation onto a target portion of a substrate; and
a measurement system having at least one catoptrical system, wherein said measurement system is configured to determine a position of the target portion in the patterned beam of radiation, using an optical path that traverses said at least one catoptrical system.
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Abstract
A lithographic projection apparatus according to an embodiment of the invention includes a measurement system configured to determine a position of a target portion of a substrate, using at least one among an optical sensing operation and an optical detecting operation. The position is determined via an optical path that includes at least one catoptrical system arranged to have an imaging function of at least one dioptrical element.
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Citations
32 Claims
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1. A lithographic apparatus comprising:
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a projection system configured to project a patterned beam of radiation onto a target portion of a substrate; and
a measurement system having at least one catoptrical system, wherein said measurement system is configured to determine a position of the target portion in the patterned beam of radiation, using an optical path that traverses said at least one catoptrical system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A lithographic projection apparatus comprising:
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a projection system configured to project a patterned beam of radiation onto a target portion of a substrate; and
a measurement system configured to determine a position of the target portion using at least one among an optical sensing operation and an optical detecting operation, wherein the measurement system is configured to determine the position via an optical path that includes at least one catoptrical system. - View Dependent Claims (10, 11, 12, 13)
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14. A lithographic apparatus comprising:
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a projection system configured to project a patterned beam of radiation onto a target portion of a substrate; and
a level sensor including at least one catoptrical system, wherein the level sensor is configured to determine a height of a surface of the substrate using an optical path that includes the at least one catoptrical system. - View Dependent Claims (15, 16, 17, 18, 19)
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20. A device manufacturing method, said method comprising:
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projecting a patterned beam of radiation onto a target portion of a substrate; and
using at least one of an optical detection action and an optical sensing action to position the target portion in the patterned beam of radiation via an optical path that includes at least one catoptrical system. - View Dependent Claims (21, 22, 23, 24, 25, 26)
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27. An optical analysis system comprising:
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at least one of an optical detector and an optical sensor configured to determine a position of a target portion of a surface, wherein said at least one of an optical detector and an optical sensor is configured to determine the position via an optical path that includes at least one catoptrical system.
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28. A device manufacturing method, said method comprising:
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projecting a patterned beam of radiation onto a target portion of a substrate; and
using a measurement system to position the target portion in the patterned beam of radiation via an optical path that includes at least one catoptrical system. - View Dependent Claims (29, 30, 31, 32)
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Specification