Programmable aperture for lithographic imaging systems
First Claim
1. A programmable aperture for a lithographic imaging system, the programmable aperture comprising:
- a grid including a plurality of pixels, wherein each pixel can be controlled to provide a predetermined light state.
2 Assignments
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Accused Products
Abstract
Printing very small features on a wafer may require optimizing an illumination configuration in the lithographic imaging system. In a conventional system, an aperture provides only one illumination configuration. In contrast, a programmable aperture can ensure that each mask design is printed using its optimized illumination configuration while minimizing the amount of hardware in the system. The programmable aperture can include a grid of pixels, wherein each pixel can be controlled to provided a predetermined light state. Once installed, the programmable aperture can provide any number of illumination configurations, thereby eliminating the expense of fabricating, testing, and repairing multiple apertures as well as the time associated with installing those multiple apertures.
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Citations
41 Claims
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1. A programmable aperture for a lithographic imaging system, the programmable aperture comprising:
a grid including a plurality of pixels, wherein each pixel can be controlled to provide a predetermined light state. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A lithographic imaging system comprising:
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a light source for exposing a wafer;
a grid for receiving light from the light source, the grid including a plurality of pixels for providing a plurality of illumination configurations;
a condenser lens for projecting light from the grid onto a mask; and
a projection lens for capturing light from the mask and then focusing the light onto the wafer. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15)
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16. A lithographic imaging system comprising:
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illumination means for exposing a wafer;
programmable means for receiving light from the light source and providing a plurality of illumination configurations;
means for projecting light from the aperture onto a mask; and
means for capturing light from the mask and then focusing the light onto the wafer. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23)
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24. A method of printing a wafer, the method comprising:
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generating radiation from a light source;
receiving light from the light source;
programmably providing a plurality of illumination configurations using the light;
projecting a predetermined illumination configuration onto each mask used in printing the wafer; and
capturing light from each mask and focusing the light onto the wafer. - View Dependent Claims (25, 26, 27, 28, 29, 30, 31, 32, 33)
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34. A method of implementing an aperture for a lithographic imaging system, the method comprising:
controlling a plurality of pixels to provide predetermined light states. - View Dependent Claims (35, 36, 37, 38, 39, 40, 41)
Specification