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Pad conditioner of CMP equipment

  • US 20040198200A1
  • Filed: 01/29/2004
  • Published: 10/07/2004
  • Est. Priority Date: 02/12/2003
  • Status: Active Grant
First Claim
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1. A pad conditioner of planarization equipment for conditioning a surface of a polishing pad, comprising:

  • a disk holder that supports a polishing disk; and

    a conditioner head to which said disk holder is mounted so as to be rotatable and linearly movable up and down, said conditioner head having a rotary driving device operatively connected to said disk holder so as to rotate said disk holder about an axis of rotation, and linear driving device operative to move the disk holder between an upper position and a lower position, said linear driving device including a first magnet and a second magnet, said first magnet being connected to said disk holder, and said second magnetic being connected to said conditioner head opposite the first magnet, whereby the disk holder can be moved relative to the conditioner head by a magnetic force between the first and second magnets.

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