Chemical vapor deposition apparatus
First Claim
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1. A chemical vapor deposition apparatus comprising:
- a chamber having an inner space;
a gas feed member for supplying a gas into the chamber;
a susceptor disposed in the chamber and supporting a substrate;
a diffuser partitioning the inner space of the chamber into first and second partitions and having a plurality of holes connecting the first partition and the second partition for gas communication; and
an insulating frame disposed between the chamber and the diffuser, wherein the diffuser includes an extension overlapping a surface of the insulating frame.
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Abstract
A chemical vapor deposition apparatus is provided, which includes: a chamber having an inner space; a gas feed member for supplying a gas into the chamber; a susceptor disposed in the chamber and supporting a substrate; a diffuser partitioning the inner space of the chamber into first and second partitions and having a plurality of holes connecting the first partition and the second partition for gas communication; a diffuser frame incorporated into the diffuser; and an insulating frame disposed between the chamber and the diffuser.
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Citations
9 Claims
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1. A chemical vapor deposition apparatus comprising:
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a chamber having an inner space;
a gas feed member for supplying a gas into the chamber;
a susceptor disposed in the chamber and supporting a substrate;
a diffuser partitioning the inner space of the chamber into first and second partitions and having a plurality of holes connecting the first partition and the second partition for gas communication; and
an insulating frame disposed between the chamber and the diffuser, wherein the diffuser includes an extension overlapping a surface of the insulating frame. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A chemical vapor deposition apparatus comprising:
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a chamber having an inner space;
a gas feed member for supplying a gas into the chamber;
a susceptor disposed in the chamber and supporting a substrate;
a diffuser partitioning the inner space of the chamber into first and second partitions and having a plurality of holes connecting the first partition and the second partition for gas communication;
a diffuser frame incorporated into the diffuser; and
an insulating frame disposed between the chamber and the diffuser.
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Specification