×

Backflush chamber clean

  • US 20040200499A1
  • Filed: 04/11/2003
  • Published: 10/14/2004
  • Est. Priority Date: 04/11/2003
  • Status: Active Grant
First Claim
Patent Images

1. A method of cleaning a substrate processing chamber having a gas distribution showerhead adapted to release one or more processing gases into an interior substrate processing region of the chamber during a substrate processing operation, the method comprising:

  • generating reactive species suitable for removing unwanted material deposits from an interior of the chamber; and

    flowing the reactive species from the interior substrate processing region through the gas distribution showerhead.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×