Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition
First Claim
1. A gas distribution plate assembly for a processing chamber, comprising:
- a diffuser plate having an upstream side and a downstream side; and
a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate, wherein at least one of the gas passages comprises;
a first hole extending from the upstream side and having a first diameter;
a second hole concentric with the first hole extending from the downstream side and having a second diameter; and
an orifice fluidly coupling the first hole and the second hole and having a diameter less than the first and second holes.
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Accused Products
Abstract
Embodiments of a gas distribution plate for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate includes a diffuser plate having a plurality of gas passages passing between an upstream side and a downstream side of the diffuser plate. At least one of the gas passages includes a first hole and a second hole coupled by an orifice hole. The first hole extends from the upstream side of the diffuser plate while the second hole extends from the downstream side. The orifice hole has a diameter less than the respective diameters of the first and second holes.
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Citations
23 Claims
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1. A gas distribution plate assembly for a processing chamber, comprising:
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a diffuser plate having an upstream side and a downstream side; and
a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate, wherein at least one of the gas passages comprises;
a first hole extending from the upstream side and having a first diameter;
a second hole concentric with the first hole extending from the downstream side and having a second diameter; and
an orifice fluidly coupling the first hole and the second hole and having a diameter less than the first and second holes. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A gas distribution plate assembly for a processing chamber, comprising:
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a diffuser plate assembly having an aluminum upstream side and a downstream side; and
a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate assembly, wherein at least one of the gas passages comprises;
a first hole extending from the upstream side;
an orifice hole fluidly coupled to a bottom of the first hole; and
a flared second hole extending from the orifice hole to the downstream side, wherein a diameter of the orifice hole is less than the first and second holes. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A gas distribution plate assembly for a processing chamber, comprising:
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a polygonal aluminum diffuser plate having an upstream side and a downstream side; and
a plurality of gas passages passing between the upstream and downstream sides of a center region of the diffuser plate, wherein at least one of the gas passages comprises;
a first hole extending from the upstream side;
a flared second hole concentric with the first hole extending from the downstream side and having a diameter at least about equal to or greater than the diameter of the first hole; and
an orifice hole coupling the first and second holes and having a diameter less than the first hole. - View Dependent Claims (21, 22, 23)
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Specification