Method for fabricating an interference display unit
First Claim
1. A method for manufacturing an optical interference display unit disposed on a substrate, the method comprising:
- forming a first electrode on the substrate;
forming a sacrificial layer on the first electrode;
forming at least two openings in the sacrificial layer and the first electrode to define a position of the optical interference display unit;
forming a photosensitive material layer to fill the openings and cover the sacrificial layer;
patterning the photosensitive material layer to form a support in each of the openings and at least one arm on the support, wherein the support and the at least one arm form a post;
forming a second electrode on the sacrificial layer and the at least one arm;
performing a thermal process to treat the post; and
removing the sacrificial layer.
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Abstract
A method for fabricating an interference display unit is provided. A first plate and a sacrificial layer are formed in order on a substrate and at least two openings are formed in the first plate and the sacrificial layer. A photoresist layer is spin-coated on the sacrificial layer and fills the openings. A photolithographic process patterns the photoresist layer to define a support with an arm. A second plate is formed on the sacrificial layer and posts. The arm'"'"'s stress is released through a thermal process. The position of the arm is shifted and the distance between the first plate and the second plate is therefore defined. Finally, The sacrificial layer is removed.
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Citations
35 Claims
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1. A method for manufacturing an optical interference display unit disposed on a substrate, the method comprising:
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forming a first electrode on the substrate;
forming a sacrificial layer on the first electrode;
forming at least two openings in the sacrificial layer and the first electrode to define a position of the optical interference display unit;
forming a photosensitive material layer to fill the openings and cover the sacrificial layer;
patterning the photosensitive material layer to form a support in each of the openings and at least one arm on the support, wherein the support and the at least one arm form a post;
forming a second electrode on the sacrificial layer and the at least one arm;
performing a thermal process to treat the post; and
removing the sacrificial layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A method for manufacturing an optical interference display unit disposed on a substrate, the method comprising:
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forming a first electrode on the substrate;
forming a sacrificial layer on the first electrode;
forming at least two openings in the sacrificial layer and the first electrode to define a position of the optical interference display unit;
forming a support in each of the openings and at least one arm on the support, wherein the support and the at least one arm form a post;
forming a second electrode on the sacrificial layer and the at least one arm;
performing a thermal process to treat the post; and
removing the sacrificial layer. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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Specification