Semiconductor fabricating apparatus
First Claim
1. A semiconductor fabricating apparatus having a resonant frequency sensor disposed in a processing chamber, wherein a change in the resonant frequency of said resonant frequency sensor is detected in order to determine the maintenance timing.
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Accused Products
Abstract
A resonant frequency sensor is disposed in a plasma-processing chamber included in a semiconductor fabricating apparatus. A change in the resonant frequency caused by etching, sputtering or deposition is sensed in order to detect the timing of performing the maintenance of the processing chamber. If data representing the relationship between an amount of etching or deposition occurring at a predetermined position in the processing chamber and occurrence of an abnormality is produced in advance, an optimal maintenance timing can be determined.
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Citations
3 Claims
- 1. A semiconductor fabricating apparatus having a resonant frequency sensor disposed in a processing chamber, wherein a change in the resonant frequency of said resonant frequency sensor is detected in order to determine the maintenance timing.
Specification